Measurement and Analysis of Surface Temperature Gradients on Magnetron Sputtered Thin Film Growth Studied Using NiCr/NiSi Thin Film Thermocouples (Small 1/2025)
Zhihui Liu, Yumeng Yang, Yi Sun, Tengda Guo, Kai Shen, Yongjun Cheng, Bi Wang, Kai Hu, Chuanbing Zhang, Gang Hao, Jiankang Zhou, Mengxuan Wu, Baoli Cui, Wanyu Ding, Zixi Wang
{"title":"Measurement and Analysis of Surface Temperature Gradients on Magnetron Sputtered Thin Film Growth Studied Using NiCr/NiSi Thin Film Thermocouples (Small 1/2025)","authors":"Zhihui Liu, Yumeng Yang, Yi Sun, Tengda Guo, Kai Shen, Yongjun Cheng, Bi Wang, Kai Hu, Chuanbing Zhang, Gang Hao, Jiankang Zhou, Mengxuan Wu, Baoli Cui, Wanyu Ding, Zixi Wang","doi":"10.1002/smll.202570004","DOIUrl":null,"url":null,"abstract":"<p><b>Thin Film Growth</b></p><p>In article number 2404829, Wanyu Ding, Zixi Wang, and co-workers established a three-layer NiCr/NiSi thin-film thermocouple temperature measurement system in TiO<sub>2</sub> film growth processes, to measure the temperature gradient from TiO<sub>2</sub> film growth surface to substrate. The temperature of substrate was about 132.05 °C, while the temperature difference between TiO<sub>2</sub> film growth surface and substrate could reach to was about 144.71 °C.\n\n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":228,"journal":{"name":"Small","volume":"21 1","pages":""},"PeriodicalIF":12.1000,"publicationDate":"2025-01-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/smll.202570004","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Small","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/smll.202570004","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Thin Film Growth
In article number 2404829, Wanyu Ding, Zixi Wang, and co-workers established a three-layer NiCr/NiSi thin-film thermocouple temperature measurement system in TiO2 film growth processes, to measure the temperature gradient from TiO2 film growth surface to substrate. The temperature of substrate was about 132.05 °C, while the temperature difference between TiO2 film growth surface and substrate could reach to was about 144.71 °C.
期刊介绍：
Small serves as an exceptional platform for both experimental and theoretical studies in fundamental and applied interdisciplinary research at the nano- and microscale. The journal offers a compelling mix of peer-reviewed Research Articles, Reviews, Perspectives, and Comments.
With a remarkable 2022 Journal Impact Factor of 13.3 (Journal Citation Reports from Clarivate Analytics, 2023), Small remains among the top multidisciplinary journals, covering a wide range of topics at the interface of materials science, chemistry, physics, engineering, medicine, and biology.
Small's readership includes biochemists, biologists, biomedical scientists, chemists, engineers, information technologists, materials scientists, physicists, and theoreticians alike.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
