Development of REBCO Thin Films Using MOCVD on Non-Standard Buffers and Substrates

IF 1.7 3区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Transactions on Applied Superconductivity Pub Date : 2024-12-23 DOI:10.1109/TASC.2024.3513942
Manoj Thevalappilly Paulose;Jithin Sai Sandra;Md Abu Sayeed;Venkat Selvamanickam
{"title":"Development of REBCO Thin Films Using MOCVD on Non-Standard Buffers and Substrates","authors":"Manoj Thevalappilly Paulose;Jithin Sai Sandra;Md Abu Sayeed;Venkat Selvamanickam","doi":"10.1109/TASC.2024.3513942","DOIUrl":null,"url":null,"abstract":"Rare Earth Barium Copper Oxide (REBCO) superconducting thin films on dielectric substrates are being developed for microwave and radio frequency applications such as transmission lines for quantum computing. Our group previously demonstrated the growth of REBCO thin films on short, flexible, yttria-stabilized-zirconia (YSZ) substrates. In this study, we report high-quality REBCO films on 12-cm-long flexible YSZ substrates. We planarized the surface of 40-µm-thick flexible YSZ substrate by vertical dip coating in n-propanol solution to achieve average surface roughness \n<italic>R</i>\n \n<sub>a</sub>\n<1>3</sub>\n (LMO) cap layer. The out-of-plane and in-plane texture values of the LMO films were 3.9° and 6.9° respectively. REBCO films of a thickness of 350 nm were grown on these 12-cm-long flexible YSZ substrates by metal organic chemical vapor deposition (MOCVD) and a critical current density (\n<italic>J</i>\n \n<sub>c</sub>\n) of 1.06 MA/cm\n<sup>2</sup>\n was achieved at 77 K, 0 T. We are also developing an electrically conductive buffer architecture for defect-tolerant REBCO tapes, to shunt current from the REBCO film to substrate. This buffer architecture is based on conductive titanium nitride buffer on Hastelloy C276 substrate, with an oxide cap layer deposited by magnetron sputtering. REBCO films, about 350 nm thick, have been grown by MOCVD on this buffer architecture with a \n<italic>J</i>\n \n<sub>c</sub>\n greater than 1 MA/cm\n<sup>2</sup>\n at 77 K, self-field. Texture, microstructure, composition and critical current density of REBCO tapes on electrically conductive buffers will be presented.","PeriodicalId":13104,"journal":{"name":"IEEE Transactions on Applied Superconductivity","volume":"35 5","pages":"1-5"},"PeriodicalIF":1.7000,"publicationDate":"2024-12-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Applied Superconductivity","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10812685/","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

Rare Earth Barium Copper Oxide (REBCO) superconducting thin films on dielectric substrates are being developed for microwave and radio frequency applications such as transmission lines for quantum computing. Our group previously demonstrated the growth of REBCO thin films on short, flexible, yttria-stabilized-zirconia (YSZ) substrates. In this study, we report high-quality REBCO films on 12-cm-long flexible YSZ substrates. We planarized the surface of 40-µm-thick flexible YSZ substrate by vertical dip coating in n-propanol solution to achieve average surface roughness R a <1>3 (LMO) cap layer. The out-of-plane and in-plane texture values of the LMO films were 3.9° and 6.9° respectively. REBCO films of a thickness of 350 nm were grown on these 12-cm-long flexible YSZ substrates by metal organic chemical vapor deposition (MOCVD) and a critical current density ( J c ) of 1.06 MA/cm 2 was achieved at 77 K, 0 T. We are also developing an electrically conductive buffer architecture for defect-tolerant REBCO tapes, to shunt current from the REBCO film to substrate. This buffer architecture is based on conductive titanium nitride buffer on Hastelloy C276 substrate, with an oxide cap layer deposited by magnetron sputtering. REBCO films, about 350 nm thick, have been grown by MOCVD on this buffer architecture with a J c greater than 1 MA/cm 2 at 77 K, self-field. Texture, microstructure, composition and critical current density of REBCO tapes on electrically conductive buffers will be presented.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
利用MOCVD技术在非标准缓冲层和衬底上制备REBCO薄膜
电介质衬底上的稀土钡氧化铜(REBCO)超导薄膜正被开发用于微波和射频应用,如量子计算的传输线。我们的团队之前证明了在短的、柔性的、钇稳定的氧化锆(YSZ)衬底上生长REBCO薄膜。在这项研究中,我们报道了在12厘米长的柔性YSZ衬底上的高质量REBCO薄膜。采用正丙醇溶液垂直浸渍法对40µm厚的柔性YSZ基板表面进行了平面化处理,获得了平均表面粗糙度R a3 (LMO)的帽层。LMO膜的面外织构值为3.9°,面内织构值为6.9°。通过金属有机化学气相沉积(MOCVD)在这些12厘米长的柔性YSZ衬底上生长了厚度为350 nm的REBCO薄膜,在77 K, 0 t下达到了1.06 MA/cm2的临界电流密度(J c)。我们还在开发一种用于耐缺陷REBCO带的导电缓冲结构,以将电流从REBCO薄膜分流到衬底。该缓冲结构基于哈氏C276衬底上的导电氮化钛缓冲层,并通过磁控溅射沉积氧化帽层。利用MOCVD在该缓冲结构上生长出了厚约350 nm的REBCO薄膜,自场温度为77 K时,jc大于1 MA/cm2。介绍了导电缓冲器上REBCO带的织构、微观结构、组成和临界电流密度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
IEEE Transactions on Applied Superconductivity
IEEE Transactions on Applied Superconductivity 工程技术-工程:电子与电气
CiteScore
3.50
自引率
33.30%
发文量
650
审稿时长
2.3 months
期刊介绍: IEEE Transactions on Applied Superconductivity (TAS) contains articles on the applications of superconductivity and other relevant technology. Electronic applications include analog and digital circuits employing thin films and active devices such as Josephson junctions. Large scale applications include magnets for power applications such as motors and generators, for magnetic resonance, for accelerators, and cable applications such as power transmission.
期刊最新文献
A High-Speed, High-Resolution Transition Edge Sensor Spectrometer for Soft X-Rays at the Advanced Photon Source Design and Analysis of Short Period 2G-HTS Undulators 2024 Index IEEE Transactions on Applied Superconductivity Vol. 34 Clocked Gate Reduction With Clockless Gates in Technology Mapping for RSFQ Logic Circuits A Conical Accelerator Magnet With Unique CCT Properties
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1