Influence of Mixed Cathode Emissivity on Generated Plasma Flow in Vacuum Arc with Heated Cathode

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL Plasma Chemistry and Plasma Processing Pub Date : 2024-10-09 DOI:10.1007/s11090-024-10522-3

Ravil Usmanov, Anton Melnikov, Vladimir Polistchook, Andrey Gavrikov, Nikolay Antonov, Valentin Smirnov

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Abstract

Vacuum arc is one of the most widespread sources of multicomponent ion/plasma flows. In the paper, we examine how the emissive properties of mixed cathode components affect the parameters of generated plasma. The scheme of vacuum arc with a heated cathode made of CeO₂ + Cr and TiO₂ + Cr powders was used. The arc discharges in the current range of 30–90 A and in the cathode temperature range of 1.8–2.0 kK were studied. It was found that CeO₂ provides an intensive thermal electron emission and the arc with CeO₂ + Cr cathode has a diffuse current attachment, plasma parameters are controllable and mainly Cr ions appear in plasma. Conversely, the current constricts in the arc with a non-emissive TiO₂ + Cr cathode, the plasma parameters are unchangeable and Ti and Cr ions are generated in comparable amounts. The results presented may be useful in multicomponent plasma sources design.

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混合阴极发射率对加热阴极真空电弧中等离子体流动的影响

真空电弧是多组分离子/等离子体流最广泛的来源之一。本文研究了混合阴极组分的发射特性对产生等离子体参数的影响。采用了由CeO2 + Cr和TiO2 + Cr粉末制成的加热阴极真空电弧方案。研究了电流为30 ~ 90a、阴极温度为1.8 ~ 2.0 kK时的电弧放电情况。结果表明，CeO2提供了强烈的热电子发射，CeO2 + Cr阴极电弧具有弥漫性电流附着，等离子体参数可控，等离子体中以Cr离子为主。相反，使用非发射型TiO2 + Cr阴极时，电弧中的电流收缩，等离子体参数不变，产生的Ti和Cr离子数量相当。所得结果可用于多组分等离子体源的设计。

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.