Emergent p-Wave Superconductivity in a Dual Topological Insulator BiSe via Superconducting Proximity Effect

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-01-21 DOI:10.1021/acsami.4c15770
Gagan Rastogi, Abhinab Mohapatra, Rajamanickam Ganesan, P. S. Anil Kumar
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Abstract

The quest for anisotropic superconductors has been a long-standing pursuit due to their potential applications in quantum computing. In this regard, experimentally, d-wave and anisotropic s-wave superconducting order parameters are predominantly observed, while p-wave superconductors remain largely elusive. Achieving p-wave superconductivity in topological phases is highly desirable, as it is considered suitable for creating topologically protected qubits. To achieve topological superconductivity in the dual topological insulator BiSe, we place an s-wave superconductor NbSe2 in its close proximity employing the van der Waals epitaxy technique. Low-temperature differential conductance measurements performed at the heterojunction exhibit a dual-dip feature with a V-shaped inner dip, a characteristic of p-wave superconductivity. This observation is corroborated by the multiband 2D Blonder–Tinkham–Klapwijk (BTK) fitting, where the inner and outer gaps exhibit p-wave and s-wave character, respectively. Furthermore, the BTK analysis reveals that the two superconducting gaps experience distinct effective critical fields and transition temperatures.

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ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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