Nanoscale electromagnetic field imaging by advanced differential phase-contrast STEM

Satoko Toyama, Takehito Seki, Yuji Kohno, Yoshiki O. Murakami, Yuichi Ikuhara, Naoya Shibata
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Abstract

Nanoscale electromagnetic fields formed at localized structures such as interfaces play a pivotal role in the properties of state-of-the-art electronic and spintronic devices. Direct characterization of such local electromagnetic fields inside devices is thus crucial for propelling their research and development. In recent years, direct electromagnetic field imaging via differential phase-contrast scanning transmission electron microscopy (DPC STEM) has attracted much attention. Recent developments of tilt-scan averaging systems and magnetic-field-free objective lenses have finally enabled the practical application of this technique to electronic and spintronic devices. This progress has led to the nanoscale, quantitative observations of electric fields of p–n junctions, 2D electron gas and quantum wells, as well as magnetic fields of magnetic domains, magnetic tunnel junctions and antiferromagnets. These studies demonstrate that DPC STEM can observe local electromagnetic fields from nanometre to sub-angstrom length scales across a wide range of materials and devices. In this Review, we describe the basic principles of DPC STEM, discuss its recent developments in both hardware and imaging techniques and finally show its practical applications in device characterization. We emphasize the immense potential of advanced DPC STEM for the research and development of future electronic and spintronic devices. Direct characterization of nanoscale electromagnetic fields is crucial for propelling device development. This Review summarizes recent developments and applications of high-resolution electromagnetic field imaging by scanning transmission electron microscopy, demonstrating the real-space electromagnetic field and charge observations at device interfaces.

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先进差相衬STEM纳米级电磁场成像技术
在界面等局域结构上形成的纳米级电磁场在最先进的电子和自旋电子器件的性能中起着关键作用。因此,器件内部这种局部电磁场的直接表征对于推动其研究和发展至关重要。近年来,差分相衬扫描透射电子显微镜(DPC STEM)直接电磁场成像技术受到了广泛关注。倾斜扫描平均系统和无磁场物镜的最新发展终于使该技术在电子和自旋电子器件上的实际应用成为可能。这一进展导致了对p-n结、二维电子气和量子阱以及磁畴、磁隧道结和反铁磁体的磁场的纳米尺度、定量观察。这些研究表明,DPC STEM可以在广泛的材料和器件中观察到从纳米到亚埃长度尺度的局部电磁场。在这篇综述中,我们描述了DPC STEM的基本原理,讨论了它在硬件和成像技术方面的最新发展,最后展示了它在器件表征方面的实际应用。我们强调先进的DPC STEM在未来电子和自旋电子器件的研究和开发方面的巨大潜力。纳米级电磁场的直接表征对于推进装置的发展至关重要。本文综述了扫描透射电子显微镜高分辨率电磁场成像技术的最新进展和应用,展示了器件接口处的实空间电磁场和电荷观测。
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