{"title":"Low-cost energy-efficient EUV lithography for advanced semiconductor manufacturing","authors":"Tsumoru Shintake, Patrick Naulleau","doi":"10.1038/s44287-024-00129-3","DOIUrl":null,"url":null,"abstract":"EUV lithography is crucial for semiconductor manufacturing, with resolution affecting circuit size, performance and energy efficiency; however, it is also a highly energy-intensive process. This Comment discusses the potential of a simple two-mirror projector to tackle the longstanding issues of energy consumption and capital costs in existing EUV lithography technologies.","PeriodicalId":501701,"journal":{"name":"Nature Reviews Electrical Engineering","volume":"2 1","pages":"2-3"},"PeriodicalIF":0.0000,"publicationDate":"2025-01-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nature Reviews Electrical Engineering","FirstCategoryId":"1085","ListUrlMain":"https://www.nature.com/articles/s44287-024-00129-3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
EUV lithography is crucial for semiconductor manufacturing, with resolution affecting circuit size, performance and energy efficiency; however, it is also a highly energy-intensive process. This Comment discusses the potential of a simple two-mirror projector to tackle the longstanding issues of energy consumption and capital costs in existing EUV lithography technologies.
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