Cuina Gao , Sihui Jia , Xiaofei Yin , Zhi Li , Guang Yang , Jing Chen , Zhaoqian Li , Xingtao An
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引用次数: 0
Abstract
The interfaces between the perovskite and charge-transporting layers typically exhibit high defect concentrations, which are the primary cause of open-circuit voltage loss. Passivating the interface between the perovskite and electron-transporting layer is particularly challenging due to the dissolution of surface treatment agents during the perovskite coating. In this study, a coherent FAPbIxCl3−x buried interface was simultaneously formed during the preparation of FAPbI3. This interlayer significantly improved charge extraction and transportation from the perovskite layer, while reducing trap state density. As a result, the open-circuit voltage increased from 1.01 V to 1.10 V, with the PCE improved from 19.05% to 22.89%.
期刊介绍:
ChemComm (Chemical Communications) is renowned as the fastest publisher of articles providing information on new avenues of research, drawn from all the world''s major areas of chemical research.