Au-In Alloy for Excellent Ohmic Contact in GeSe Devices with Enhanced Photodetector Properties.

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-02-12 Epub Date: 2025-01-31 DOI:10.1021/acsami.4c20063
Ruowang Chen, Hui Shi, Yu Liu, Mingyuan Wang, Dundong Yuan, Junpeng Shu, Md Al Shahriar Akash, Ming Tian, Zhenning Hu, Jiamin Xue, Hong-Quan Zhao, Fengyu Li, Neng Wan
{"title":"Au-In Alloy for Excellent Ohmic Contact in GeSe Devices with Enhanced Photodetector Properties.","authors":"Ruowang Chen, Hui Shi, Yu Liu, Mingyuan Wang, Dundong Yuan, Junpeng Shu, Md Al Shahriar Akash, Ming Tian, Zhenning Hu, Jiamin Xue, Hong-Quan Zhao, Fengyu Li, Neng Wan","doi":"10.1021/acsami.4c20063","DOIUrl":null,"url":null,"abstract":"<p><p>Metal-semiconductor contact plays a significant role in devices such as transistors, photoemitters, and photodetectors. Here, the Au<sub><i>x</i></sub>In<sub><i>y</i></sub> alloy contact gives a state-of-the-art low <i>R</i><sub>C</sub> (contact resistance) in GeSe devices. The <i>R</i><sub>C</sub> of GeSe-Au<sub><i>x</i></sub>In<sub><i>y</i></sub> is measured to be 25 kΩ μm under channel carrier concentration around <i>p</i> = 2.490 × 10<sup>10</sup> cm<sup>-2</sup>. This low <i>R</i><sub>C</sub> is ascribed to a small barrier height of 16 meV. Our density functional theory calculation found the formation of a high conductive metallic GeSe-Au<sub><i>x</i></sub>In<sub><i>y</i></sub> interface due to indium doping, which screens the possible interface disorder-induced gap states and metal-induced gap states that are observed when using pure In (indium) or Au (gold) metal. The GeSe-Au<sub><i>x</i></sub>In<sub><i>y</i></sub> photodetectors show enhanced photoresponsivity with a specific photoresponsivity of 6.46 × 10<sup>4</sup> A/W and a detectivity of 8.9 × 10<sup>13</sup> Jones (at 450 nm wavelength). Our study is helpful in designing high-performance GeSe-based devices.</p>","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":" ","pages":"10158-10167"},"PeriodicalIF":8.2000,"publicationDate":"2025-02-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1021/acsami.4c20063","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2025/1/31 0:00:00","PubModel":"Epub","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

Metal-semiconductor contact plays a significant role in devices such as transistors, photoemitters, and photodetectors. Here, the AuxIny alloy contact gives a state-of-the-art low RC (contact resistance) in GeSe devices. The RC of GeSe-AuxIny is measured to be 25 kΩ μm under channel carrier concentration around p = 2.490 × 1010 cm-2. This low RC is ascribed to a small barrier height of 16 meV. Our density functional theory calculation found the formation of a high conductive metallic GeSe-AuxIny interface due to indium doping, which screens the possible interface disorder-induced gap states and metal-induced gap states that are observed when using pure In (indium) or Au (gold) metal. The GeSe-AuxIny photodetectors show enhanced photoresponsivity with a specific photoresponsivity of 6.46 × 104 A/W and a detectivity of 8.9 × 1013 Jones (at 450 nm wavelength). Our study is helpful in designing high-performance GeSe-based devices.

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具有增强光电探测器性能的GeSe器件中用于优异欧姆接触的Au-In合金。
金属-半导体接触在晶体管、光电发射器和光电探测器等器件中起着重要的作用。在这里,AuxIny合金触点在GeSe器件中提供了最先进的低RC(接触电阻)。在通道载流子浓度p = 2.490 × 1010 cm-2附近,测得gase - auxin的RC为25 kΩ μm。这种低RC归因于16兆电子伏的小势垒高度。我们的密度泛函理论计算发现,由于掺杂铟,形成了一个高导电性的金属gase - auxin界面,屏蔽了使用纯In(铟)或Au(金)金属时可能出现的界面无序诱导的间隙状态和金属诱导的间隙状态。在450nm波长下,gase - auxin光电探测器的比光响应率为6.46 × 104 a /W,探测率为8.9 × 1013 Jones。我们的研究有助于设计高性能的基于geses的器件。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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