Au-In Alloy for Excellent Ohmic Contact in GeSe Devices with Enhanced Photodetector Properties.

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-01-31 DOI:10.1021/acsami.4c20063
Ruowang Chen, Hui Shi, Yu Liu, Mingyuan Wang, Dundong Yuan, Junpeng Shu, Md Al Shahriar Akash, Ming Tian, Zhenning Hu, Jiamin Xue, Hong-Quan Zhao, Fengyu Li, Neng Wan
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引用次数: 0

Abstract

Metal-semiconductor contact plays a significant role in devices such as transistors, photoemitters, and photodetectors. Here, the AuxIny alloy contact gives a state-of-the-art low RC (contact resistance) in GeSe devices. The RC of GeSe-AuxIny is measured to be 25 kΩ μm under channel carrier concentration around p = 2.490 × 1010 cm-2. This low RC is ascribed to a small barrier height of 16 meV. Our density functional theory calculation found the formation of a high conductive metallic GeSe-AuxIny interface due to indium doping, which screens the possible interface disorder-induced gap states and metal-induced gap states that are observed when using pure In (indium) or Au (gold) metal. The GeSe-AuxIny photodetectors show enhanced photoresponsivity with a specific photoresponsivity of 6.46 × 104 A/W and a detectivity of 8.9 × 1013 Jones (at 450 nm wavelength). Our study is helpful in designing high-performance GeSe-based devices.

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ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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