Polarization-Sensitive Solar-Blind Ultraviolet Photodetectors Based on Semipolar (112̅2) AlGaN Film.

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-02-12 Epub Date: 2025-01-31 DOI:10.1021/acsami.4c18352
Yaqi Gao, Yali Yu, Jiankun Yang, Pan Wang, Yiwei Duo, Juehan Yang, Ziqiang Huo, Junxue Ran, Junxi Wang, Zhongming Wei, Tongbo Wei
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Abstract

Wide bandgap semiconductor AlGaN alloys have been identified as key materials to fabricate solar-blind ultraviolet photodetectors (SBUV PDs). Herein, a self-driven SBUV polarization-sensitive PD (PSPD) based on semipolar (112̅2)-oriented AlGaN films is reported. Using the flow-rate modulation epitaxy method, the full widths at half maximum (FWHMs) for the obtained (112̅2) AlGaN along [112̅3̅] and [11̅00] rocking curves are 0.205° and 0.262°, respectively, representing the best results for heteroepitaxial semipolar AlGaN so far. Density functional theory calculations and experimental results reveal that semipolar AlGaN possesses in-plane anisotropy. The self-driven (112̅2) AlGaN PSPDs exhibit strong polarization-sensitive photoresponse with a polarization ratio of 1.54 at 266 nm and rapid response of 450/450 ms compared to other low-dimensional semiconductor materials. More interestingly, we observe positive and negative photoresponse behaviors under UV light illumination due to surface states and charge transfer. Our results may enable potential applications in multifunctional SBUV optoelectronic devices.

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宽禁带半导体AlGaN合金已被确定为制造太阳盲紫外探测器(SBUV pd)的关键材料。本文报道了一种基于半极性(112°2)取向AlGaN薄膜的自驱动SBUV极化敏感PD (PSPD)。采用流量调制外延方法,得到的(112°2)AlGaN沿[112°3°]和[11°00]摇曲线的半最大全宽度(FWHMs)分别为0.205°和0.262°,是迄今为止异质外延半极性AlGaN的最佳结果。密度泛函理论计算和实验结果表明,半极性AlGaN具有面内各向异性。与其他低维半导体材料相比,自驱动(112°2)AlGaN pspd具有较强的偏振敏感光响应,在266 nm处的偏振比为1.54,响应速度为450/450 ms。更有趣的是,由于表面态和电荷转移,我们观察到紫外光照射下的正、负光响应行为。我们的研究结果可能在多功能SBUV光电器件中有潜在的应用。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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