Surface Nanostructure Fabrication by Initiated Chemical Vapor Deposition and Its Combined Technologies

Abstract

Initiated chemical vapor deposition (iCVD) is a versatile technique that enables the direct growth of nanostructures and surface modification of such structures. Unlike traditional CVD methods, iCVD operates under mild conditions, allowing for damage-free processing of delicate substrates. It can produce highly uniform polymer layers, with thicknesses ranging from over 15 μm to sub-10 nm, conformally coating intricate geometries. The broad range of polymer compositions achievable with iCVD offers precise control of surface chemistry. In this Viewpoint, we present iCVD’s mechanisms and the principles for controlling the composition and morphology of deposited layers. We summarize various surface nanostructures including nanodomes, nanocones, nanowrinkles, nanoparticles, and nanoporous structures that are directly fabricated using iCVD. We also demonstrate the integration of iCVD with other advanced methods, such as photo, soft, and nanoimprint lithography; template-assisted growth; and thermal CVD, to leverage the advantages of multiple methods and overcome individual limitations in nanofabrication. Through these combined strategies, we show the iCVD’s potential for creating multifunctional nanostructures with broad applications across engineering and biomedical fields.