Multistage Feedback Control Method for Armature Velocity in Electromagnetic Rail Launch

IF 1.5 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS IEEE Transactions on Plasma Science Pub Date : 2024-12-30 DOI:10.1109/TPS.2024.3519166
Yuting Zhang;Zhenchun Wang;Yan Hu;Wenlai Zhang
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Abstract

The stability of armature velocity is one of the crucial indicators for evaluating the performance of electromagnetic launch systems. A multistage control method for armature muzzle velocity is proposed based on the discharge time and quantity of the power module. By analyzing the pulse power supply model, the relationship between the discharge time, quantity, and armature velocity of the pulse power supply module is established. A multistage feedback control algorithm based on pulse discharge is introduced, which includes steps such as stride selection, adjustment of pulse power supply discharge time, and velocity calculation. By adjusting the discharge time and quantity of the pulse power supply according to the difference between the measured velocity at a reference position and the expected velocity, precise control of the armature velocity is achieved. When the armature muzzle velocity reaches 595.85 m/s, the proposed multistage feedback control method can maintain the accuracy of the armature muzzle velocity within 0.83%. The effectiveness of the control method is verified, providing a theoretical foundation for the precise control of armature muzzle velocity in practical launch experiments.
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电磁轨道发射电枢速度多级反馈控制方法
电枢速度的稳定性是评价电磁发射系统性能的重要指标之一。提出了一种基于功率模块放电时间和放电量的电枢初速多级控制方法。通过对脉冲电源模型的分析,建立了脉冲电源模块的放电时间、放电量和电枢速度之间的关系。介绍了一种基于脉冲放电的多级反馈控制算法,该算法包括步长选择、脉冲电源放电时间调整和速度计算等步骤。根据参考位置的测量速度与期望速度的差值,调整脉冲电源的放电时间和放电量,实现对电枢速度的精确控制。当电枢初速达到595.85 m/s时,所提出的多级反馈控制方法可使电枢初速精度保持在0.83%以内。验证了控制方法的有效性,为实际发射实验中电枢初速的精确控制提供了理论基础。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
期刊最新文献
IEEE Transactions on Plasma Science information for authors Introducing IEEE Collabratec Special Issue on the 40th PSSI National Symposium on Plasma Science and Technology (PLASMA 2025) Corrections to “Investigation Into Increase Process of High-Power Microwave With S Curve” IEEE Transactions on Plasma Science Special Issue on Discharges and Electrical Insulation in Vacuum
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