Extended T2 times of shallow implanted NV in chemically mechanically polished diamond

IF 3.5 2区物理与天体物理 Q2 PHYSICS, APPLIED Applied Physics Letters Pub Date : 2025-02-04 DOI:10.1063/5.0244913

S. Tyler, J. Newland, P. Hepworth, A. Wijesekara, I. R. Gullick, M. L. Markham, M. E. Newton, B. L. Green

引用次数: 0

Abstract

Mechanical polishing of diamond is known to be detrimental to the spin coherence time and strain environment of near-surface defects via intrinsic introduction of subsurface damage: this damage is typically removed by inductively coupled plasma reactive ion etching (ICP-RIE). By utilizing a chemical mechanical polishing (CMP) process to prepare ⟨001⟩ diamond surfaces, we demonstrate that we can achieve 13C-limited spin lifetimes of shallow implanted (≤34 nm) nitrogen vacancy (NV) centers in an industrially scalable process. We compare spin lifetimes (T2) of three diamonds processed with CMP with one processed by ICP-RIE and observe an increased median T2 of 340 μs in the CMP-processed samples for 15NV centers implanted and annealed under identical conditions.

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

众所周知，对金刚石进行机械抛光会通过表面下损伤的内在引入而损害近表面缺陷的自旋相干时间和应变环境：这种损伤通常通过电感耦合等离子体反应离子刻蚀（ICP-RIE）来消除。通过利用化学机械抛光 (CMP) 工艺制备⟨001⟩金刚石表面，我们证明可以在工业可扩展工艺中实现浅植入（≤34 nm）氮空位 (NV) 中心的 13C 限制自旋寿命。我们比较了用 CMP 和用 ICP-RIE 处理的三种金刚石的自旋寿命（T2），观察到在相同条件下植入并退火的 15NV 中心，CMP 处理样品的中位 T2 增加了 340 μs。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文去求助

来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.