A simulation study of grayscale ice lithography for spiral phase plates in near infrared wavelengths

IF 2.6 4区工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Microelectronic Engineering Pub Date : 2024-12-26 DOI:10.1016/j.mee.2024.112308

Kangping Liu , Jinyu Guo , Shuoqiu Tian , Wentao Yuan , Ding Zhao , Rui Zheng , Yifang Chen , Min Qiu

{"title":"A simulation study of grayscale ice lithography for spiral phase plates in near infrared wavelengths","authors":"Kangping Liu , Jinyu Guo , Shuoqiu Tian , Wentao Yuan , Ding Zhao , Rui Zheng , Yifang Chen , Min Qiu","doi":"10.1016/j.mee.2024.112308","DOIUrl":null,"url":null,"abstract":"<div><div>Grayscale electron beam lithography (EBL) in amorphous solid water (ASW), known as ice lithography (IL), and in Polymethylmethacrylate (PMMA), respectively, for spiral phase plates (SPPs) are numerically simulated by using commercial software: Beamer, Tracer and Lab, aiming at characterizing the two lithography methods for three-dimensional nanostructures. It is found that IL is able to generate 3D SPP profiles with smoother surface than conventional EBL. Further simulation using finite difference time domain (FDTD) method is also conducted to investigate the effect of the surface roughness on the wavefront characteristics of the transformed vortex beams. Clear influence on the light regulation ability by surface roughness is found through comparison between ASW-based and PMMA-based SPPs, indicating that IL has better performance than conventional EBL in patterning 3D SPP structures. This research indicates that IL should be prospective for manufacturing high-quality micro and nanostructures with 3D profiles for modern optical devices.</div></div>","PeriodicalId":18557,"journal":{"name":"Microelectronic Engineering","volume":"297 ","pages":"Article 112308"},"PeriodicalIF":2.6000,"publicationDate":"2024-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microelectronic Engineering","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0167931724001771","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}

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Abstract

Grayscale electron beam lithography (EBL) in amorphous solid water (ASW), known as ice lithography (IL), and in Polymethylmethacrylate (PMMA), respectively, for spiral phase plates (SPPs) are numerically simulated by using commercial software: Beamer, Tracer and Lab, aiming at characterizing the two lithography methods for three-dimensional nanostructures. It is found that IL is able to generate 3D SPP profiles with smoother surface than conventional EBL. Further simulation using finite difference time domain (FDTD) method is also conducted to investigate the effect of the surface roughness on the wavefront characteristics of the transformed vortex beams. Clear influence on the light regulation ability by surface roughness is found through comparison between ASW-based and PMMA-based SPPs, indicating that IL has better performance than conventional EBL in patterning 3D SPP structures. This research indicates that IL should be prospective for manufacturing high-quality micro and nanostructures with 3D profiles for modern optical devices.

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来源期刊

Microelectronic Engineering 工程技术-工程：电子与电气

CiteScore

5.30

自引率

4.30%

发文量

131

审稿时长

29 days

期刊介绍： Microelectronic Engineering is the premier nanoprocessing, and nanotechnology journal focusing on fabrication of electronic, photonic, bioelectronic, electromechanic and fluidic devices and systems, and their applications in the broad areas of electronics, photonics, energy, life sciences, and environment. It covers also the expanding interdisciplinary field of "more than Moore" and "beyond Moore" integrated nanoelectronics / photonics and micro-/nano-/bio-systems. Through its unique mixture of peer-reviewed articles, reviews, accelerated publications, short and Technical notes, and the latest research news on key developments, Microelectronic Engineering provides comprehensive coverage of this exciting, interdisciplinary and dynamic new field for researchers in academia and professionals in industry.