Amitkumar R. Patil , Tukaram D. Dongale , Keshav Y. Rajpure
{"title":"Metal tungstates for resistive memory applications: A mini review","authors":"Amitkumar R. Patil , Tukaram D. Dongale , Keshav Y. Rajpure","doi":"10.1016/j.cap.2024.12.007","DOIUrl":null,"url":null,"abstract":"<div><div>Metal tungstates are emerging as promising materials for resistive memory applications due to their excellent resistive switching (RS) properties. This review explores the potential of metal tungstate-based devices for non-volatile memory applications. It summarizes the recent advancements in material design, device fabrication, and RS mechanisms. The key performance characteristics, including retention time, endurance, and switching speed, are also discussed. Finally, the challenges and future perspectives of metal tungstates in resistive memory technology are addressed.</div></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"71 ","pages":"Pages 70-79"},"PeriodicalIF":2.4000,"publicationDate":"2024-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Current Applied Physics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S156717392400289X","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Metal tungstates are emerging as promising materials for resistive memory applications due to their excellent resistive switching (RS) properties. This review explores the potential of metal tungstate-based devices for non-volatile memory applications. It summarizes the recent advancements in material design, device fabrication, and RS mechanisms. The key performance characteristics, including retention time, endurance, and switching speed, are also discussed. Finally, the challenges and future perspectives of metal tungstates in resistive memory technology are addressed.
期刊介绍：
Current Applied Physics (Curr. Appl. Phys.) is a monthly published international journal covering all the fields of applied science investigating the physics of the advanced materials for future applications.
Other areas covered: Experimental and theoretical aspects of advanced materials and devices dealing with synthesis or structural chemistry, physical and electronic properties, photonics, engineering applications, and uniquely pertinent measurement or analytical techniques.
Current Applied Physics, published since 2001, covers physics, chemistry and materials science, including bio-materials, with their engineering aspects. It is a truly interdisciplinary journal opening a forum for scientists of all related fields, a unique point of the journal discriminating it from other worldwide and/or Pacific Rim applied physics journals.
Regular research papers, letters and review articles with contents meeting the scope of the journal will be considered for publication after peer review.
The Journal is owned by the Korean Physical Society.
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