Wenxing Wu , Jianhang Wu , Anying Sun , Jianyang Zhu , Hongqun Tang , Fang Shen , Shengyuan Lei
{"title":"Diffusion resistance behavior of W between MoSi2 coating and C103 alloy","authors":"Wenxing Wu , Jianhang Wu , Anying Sun , Jianyang Zhu , Hongqun Tang , Fang Shen , Shengyuan Lei","doi":"10.1016/j.ijrmhm.2025.107076","DOIUrl":null,"url":null,"abstract":"<div><div>MoSi<sub>2</sub>/W composite coatings were prepared on C103 alloy by sol-gel (SG) and spark plasma sintering (SPS) processes. After oxidation at 1550 °C for 100 h, the generation of volume expansion could fill the tiny pores in the W diffusion barrier layer. The diffusion growth rate of MoSi<sub>2</sub>/W coating was 109.76 μm<sup>2</sup>/h, which is only 56 % of that of MoSi<sub>2</sub> coating. This was attributed to the fact that the diffusion barrier of Si atoms in W (0.383 eV) was higher than that in Nb (0.022 eV), and there was a significant difference in electronegativity between Si<img>W (0.212) and Si<img>Nb (0.090).</div></div>","PeriodicalId":14216,"journal":{"name":"International Journal of Refractory Metals & Hard Materials","volume":"128 ","pages":"Article 107076"},"PeriodicalIF":4.6000,"publicationDate":"2025-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Refractory Metals & Hard Materials","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0263436825000411","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2025/1/24 0:00:00","PubModel":"Epub","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
MoSi2/W composite coatings were prepared on C103 alloy by sol-gel (SG) and spark plasma sintering (SPS) processes. After oxidation at 1550 °C for 100 h, the generation of volume expansion could fill the tiny pores in the W diffusion barrier layer. The diffusion growth rate of MoSi2/W coating was 109.76 μm2/h, which is only 56 % of that of MoSi2 coating. This was attributed to the fact that the diffusion barrier of Si atoms in W (0.383 eV) was higher than that in Nb (0.022 eV), and there was a significant difference in electronegativity between SiW (0.212) and SiNb (0.090).
期刊介绍：
The International Journal of Refractory Metals and Hard Materials (IJRMHM) publishes original research articles concerned with all aspects of refractory metals and hard materials. Refractory metals are defined as metals with melting points higher than 1800 °C. These are tungsten, molybdenum, chromium, tantalum, niobium, hafnium, and rhenium, as well as many compounds and alloys based thereupon. Hard materials that are included in the scope of this journal are defined as materials with hardness values higher than 1000 kg/mm2, primarily intended for applications as manufacturing tools or wear resistant components in mechanical systems. Thus they encompass carbides, nitrides and borides of metals, and related compounds. A special focus of this journal is put on the family of hardmetals, which is also known as cemented tungsten carbide, and cermets which are based on titanium carbide and carbonitrides with or without a metal binder. Ceramics and superhard materials including diamond and cubic boron nitride may also be accepted provided the subject material is presented as hard materials as defined above.
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