Electrodeposition and electrocatalytic performance of Pd-Ni alloy films from aqueous solutions for enhanced electrochemical hydrogen evolution

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS Thin Solid Films Pub Date : 2025-01-01 Epub Date: 2024-12-11 DOI:10.1016/j.tsf.2024.140587
Wangping Wu, Zhengjie Xing, Liu Ju
{"title":"Electrodeposition and electrocatalytic performance of Pd-Ni alloy films from aqueous solutions for enhanced electrochemical hydrogen evolution","authors":"Wangping Wu,&nbsp;Zhengjie Xing,&nbsp;Liu Ju","doi":"10.1016/j.tsf.2024.140587","DOIUrl":null,"url":null,"abstract":"<div><div>Palladium-nickel (Pd-Ni) alloy films were electrodeposited on copper supports. The influence of deposition parameters on the surface morphology and chemical composition of the films was investigated. The surface morphology, chemical composition and elemental states of the films were characterized using scanning electron microscopy, energy-dispersive spectroscopy and X-ray photoelectron spectroscopy, respectively. The electrocatalytic performance of the selected films was evaluated through linear sweep voltammetry, electrochemical impedance spectroscopy and cyclic voltammetry. The results demonstrate that the deposition parameters significantly influenced the deposition rate of the films. The deposition rate increased with the current density, showing a change trend in initially increase and then decrease with the rise in bath temperature and deposition time. The particle size of the film increased with both current density and deposition time. Pd-Ni films exhibited the face-centered cubic structure of polycrystalline phase, the grain size and lattice parameters decreased as the Ni-content increased. Pd<sub>78</sub>Ni<sub>22</sub> film with many spherical particles exhibited good electrocatalytic activity in alkaline solution, requiring only the overpotential of 162 mV to achieve a current density of 10 mA·cm<sup>−</sup>², which demonstrated a low Tafel slope of 47.6 mV·dec<sup>−1</sup> and an exchange current density as high as 0.326 mA·cm<sup>−2</sup>.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"809 ","pages":"Article 140587"},"PeriodicalIF":2.0000,"publicationDate":"2025-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Solid Films","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0040609024003882","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2024/12/11 0:00:00","PubModel":"Epub","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0

Abstract

Palladium-nickel (Pd-Ni) alloy films were electrodeposited on copper supports. The influence of deposition parameters on the surface morphology and chemical composition of the films was investigated. The surface morphology, chemical composition and elemental states of the films were characterized using scanning electron microscopy, energy-dispersive spectroscopy and X-ray photoelectron spectroscopy, respectively. The electrocatalytic performance of the selected films was evaluated through linear sweep voltammetry, electrochemical impedance spectroscopy and cyclic voltammetry. The results demonstrate that the deposition parameters significantly influenced the deposition rate of the films. The deposition rate increased with the current density, showing a change trend in initially increase and then decrease with the rise in bath temperature and deposition time. The particle size of the film increased with both current density and deposition time. Pd-Ni films exhibited the face-centered cubic structure of polycrystalline phase, the grain size and lattice parameters decreased as the Ni-content increased. Pd78Ni22 film with many spherical particles exhibited good electrocatalytic activity in alkaline solution, requiring only the overpotential of 162 mV to achieve a current density of 10 mA·cm², which demonstrated a low Tafel slope of 47.6 mV·dec−1 and an exchange current density as high as 0.326 mA·cm−2.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
水溶液中Pd-Ni合金膜的电沉积及电催化性能
在铜支架上电沉积钯镍(Pd-Ni)合金薄膜。研究了沉积参数对薄膜表面形貌和化学成分的影响。利用扫描电子显微镜、能量色散能谱和x射线光电子能谱分别表征了膜的表面形貌、化学成分和元素状态。通过线性扫描伏安法、电化学阻抗法和循环伏安法对所选膜的电催化性能进行了评价。结果表明,沉积参数对薄膜的沉积速率有显著影响。沉积速率随电流密度的增大而增大,随镀液温度和沉积时间的升高呈现先增大后减小的变化趋势。薄膜的粒径随电流密度和沉积时间的增加而增大。Pd-Ni薄膜呈面心立方多晶相结构,随着ni含量的增加晶粒尺寸和晶格参数减小。具有许多球形颗粒的Pd78Ni22薄膜在碱性溶液中表现出良好的电催化活性,只需要162 mV的过电位就可以达到10 mA·cm−2的电流密度,其塔菲尔斜率低至47.6 mV·dec−1,交换电流密度高达0.326 mA·cm−2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
期刊最新文献
Electrical properties and photoelectric characteristics of PbS films doped with iodine by chemical bath deposition Effect of oxygen ion implantation on electrochemical corrosion studies of carbon steel Research of smart anticorrosive coating for AZ91D alloy ZnO thin films with zero axial misorientation on amorphous substrates: deposition, structure, and properties Optical constants of Co20Fe60B20 thin films from mid-infrared to ultraviolet-visible for stratified media modeling
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1