Characterization of glass titanium silicon at different compositions grown by thermal evaporation and sputtering techniques

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS Thin Solid Films Pub Date : 2025-01-27 DOI:10.1016/j.tsf.2025.140613
Heloisa H.P. Silva , Tanna E.R. Fiuza , Rodrigo V. Portugal , Edson R. Leite , Marcelo A. de Farias , Jefferson Bettini
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Abstract

Metallic glasses, in bulk and thin film forms, are of significant interest in scientific research due to their unique properties and wide-ranging engineering applications. Key attributes such as structure, electrical conductivity, surface roughness, mechanical strength, corrosion resistance, and wear resistance determine their potential uses. This study investigates titanium-silicon (TiSi) metallic glass thin films with varying compositions grown via thermal evaporation and sputtering techniques. Comprehensive characterization methods were employed to analyze these films. The composition was determined using energy-dispersive spectroscopy and validated with electron energy loss spectroscopy, which also monitored oxidation processes. Transmission electron microscopy confirmed the films' homogeneity and absence of segregation, such as clusters or nanoparticles. Structural properties were assessed using selected-area electron diffraction and electron pair distribution functions. Thickness and roughness measurements were obtained via atomic force microscopy, while electrical properties were evaluated using the four-probe method. Hydrophobicity was determined through contact angle goniometry with water. This work examines how TiSi thin film properties vary with composition, enabling the design of surface composite materials with tailored functionalities. A specific TiSi composition was identified as suitable for use as a support material in transmission electron microscopy grids.
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块状和薄膜状金属玻璃因其独特的性能和广泛的工程应用而备受科学研究的关注。结构、导电性、表面粗糙度、机械强度、耐腐蚀性和耐磨性等关键属性决定了它们的潜在用途。本研究调查了通过热蒸发和溅射技术生长的不同成分的钛硅 (TiSi) 金属玻璃薄膜。采用综合表征方法对这些薄膜进行了分析。使用能量色散光谱法确定了薄膜的成分,并通过电子能量损失光谱法进行了验证,同时还监测了氧化过程。透射电子显微镜证实了薄膜的均匀性,且不存在团簇或纳米颗粒等偏析现象。利用选区电子衍射和电子对分布函数对结构特性进行了评估。厚度和粗糙度的测量是通过原子力显微镜进行的,而电学特性则是通过四探针法进行评估的。疏水性是通过与水的接触角测角法测定的。这项研究探讨了 TiSi 薄膜特性如何随成分变化而变化,从而设计出具有定制功能的表面复合材料。确定了一种特定的 TiSi 成分适合用作透射电子显微镜网格的支撑材料。
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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