A multi-detector neutral helium atom microscope

IF 3.9 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2025-01-10 DOI:10.1016/j.vacuum.2024.114006
C. Zhao , S.M. Lambrick , N.A. von Jeinsen , Y. Yuan , X. Zhang , A. Radić , D.J. Ward , J. Ellis , A.P. Jardine
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Abstract

Scanning helium microscopy (SHeM) is an emerging technique that uses a beam of neutral atoms to image and analyse surfaces. The low energies (64 meV) and completely non-destructive nature of the probe particles provide exceptional sensitivity for studying delicate samples and thin devices, including 2D materials. To date, around five such instruments have been constructed and are described in the literature. All represent the first attempts at SHeM construction in different laboratories, and use a single detection device. Here, we describe our second generation microscope, which is the first to offer multi-detector capabilities. The new instrument builds on recent research into SHeM optimisation and incorporates many improved design features over our previous instrument. We present measurements that highlight some of the unique capabilities the instrument provides, including 3D surface profiling, alternative imaging modes, and simultaneous acquisition of images from a mixed species beam.
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多探测器中性氦原子显微镜
扫描氦显微镜(SHeM)是一种新兴的技术,它使用一束中性原子来成像和分析表面。探针粒子的低能(~ 64 meV)和完全无损性质为研究精细样品和薄器件(包括2D材料)提供了卓越的灵敏度。迄今为止,已经建造了大约五种这样的仪器,并在文献中进行了描述。所有这些都是在不同的实验室中首次尝试构建SHeM,并使用单一的检测设备。在这里,我们描述我们的第二代显微镜,这是第一个提供多探测器的能力。新仪器建立在最近对SHeM优化的研究基础上,并结合了许多比我们以前的仪器改进的设计功能。我们介绍了仪器提供的一些独特功能的测量结果,包括3D表面轮廓,替代成像模式,以及从混合物种光束中同时获取图像。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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