Effects of annealing temperature on microstructure, optical, and optoelectronic properties of Ga2O3:F-Nb films

IF 3.9 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2025-04-01 Epub Date: 2025-01-31 DOI:10.1016/j.vacuum.2025.114097

Xue Meng , Jinxiang Deng , Qing Zhang , Rui Wu , Kun Tian , Jiawei Xu , Weiman Liu , Xiaolei Yang , Ruidong Li

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Abstract

This study successfully prepared Ga₂O₃:F-Nb films using the dual-target radio frequency co-sputtering technique and systematically investigated the effects of annealing temperature on the microstructure, optical, and optoelectronic properties of the Ga₂O₃:F-Nb films. The optimal annealing temperature for the Ga₂O₃:F-Nb films was found to be 400 °C, at which their MSM devices exhibited better performance. Additionally, when the annealing temperature was ≥600 °C, substrate mismatch and significant F loss led to film cracking or degraded device performance. Introducing a Ga₂O₃ transition layer partially addressed the substrate mismatch issue and restored the photoelectric response of the device. As the annealing temperature increased, the films' optical band gap widened and their crystalline quality improved. This enhancement in crystallinity was attributed to the reduction of oxygen vacancies during annealing. This study provides data and new insights for the research of multi-element doped Ga₂O₃ materials.

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退火温度对Ga2O3:F-Nb薄膜微观结构、光学和光电子性能的影响

本研究采用双靶射频共溅射技术成功制备了Ga2O3:F-Nb薄膜，并系统地研究了退火温度对Ga2O3:F-Nb薄膜微观结构、光学和光电性能的影响。Ga2O3:F-Nb薄膜的最佳退火温度为400℃，在此温度下MSM器件表现出较好的性能。此外，当退火温度≥600℃时，衬底失配和显著的F损耗导致薄膜开裂或器件性能下降。引入Ga2O3过渡层部分解决了衬底失配问题，恢复了器件的光电响应。随着退火温度的升高，薄膜的光学带隙变宽，晶体质量提高。结晶度的提高是由于退火过程中氧空位的减少。该研究为多元素掺杂Ga2O3材料的研究提供了数据和新的见解。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.