Atomic displacement due to the electrostatic potential energy of very highly charged ions at solid surfaces

IF 1.8 4区 化学 Q3 CHEMISTRY, PHYSICAL Surface Science Pub Date : 1993-09-10 Epub Date: 2002-09-06 DOI:10.1016/0039-6028(93)90125-4
D. Schneider, M.A. Briere, M.W. Clark, J. McDonald, J. Biersack , W. Siekhaus
{"title":"Atomic displacement due to the electrostatic potential energy of very highly charged ions at solid surfaces","authors":"D. Schneider,&nbsp;M.A. Briere,&nbsp;M.W. Clark,&nbsp;J. McDonald,&nbsp;J. Biersack ,&nbsp;W. Siekhaus","doi":"10.1016/0039-6028(93)90125-4","DOIUrl":null,"url":null,"abstract":"<div><div>Unambiguous evidence of a new radiation effect is presented based upon the occurrence of single ion defects which are created through the interaction of the Coulombic potential of slow highly charged ions (e.g., Xe<sup>44+</sup> and U<sup>70+</sup>) and the surface region of solid insulating surfaces (i.e. mica). In the cases studied, the kinetic energy of the ions is some 300 to 500 keV (~2.2 <span><math><mtext>keV</mtext><mtext>u</mtext></math></span>), while the energy associated with the electrostatic potential of the incident ions approaches 200 keV. Defect production in mica has been investigated as a function of incident ion charge, using an atomic force microscope. The volume of “blister-like” defects has been found to be proportional to the incident ion charge. These cases are compared to those of slow singly charged (Xe<sup>+</sup>) and fast (MeV) Xe<sup>17+</sup> ions. Similar defects have been found for Xe<sup>44+</sup> ions incident on other insulators such as Lexan and silica glass.</div></div>","PeriodicalId":22100,"journal":{"name":"Surface Science","volume":"294 3","pages":"Pages 403-408"},"PeriodicalIF":1.8000,"publicationDate":"1993-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Science","FirstCategoryId":"92","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0039602893901254","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2002/9/6 0:00:00","PubModel":"Epub","JCR":"Q3","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0

Abstract

Unambiguous evidence of a new radiation effect is presented based upon the occurrence of single ion defects which are created through the interaction of the Coulombic potential of slow highly charged ions (e.g., Xe44+ and U70+) and the surface region of solid insulating surfaces (i.e. mica). In the cases studied, the kinetic energy of the ions is some 300 to 500 keV (~2.2 keVu), while the energy associated with the electrostatic potential of the incident ions approaches 200 keV. Defect production in mica has been investigated as a function of incident ion charge, using an atomic force microscope. The volume of “blister-like” defects has been found to be proportional to the incident ion charge. These cases are compared to those of slow singly charged (Xe+) and fast (MeV) Xe17+ ions. Similar defects have been found for Xe44+ ions incident on other insulators such as Lexan and silica glass.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
由固体表面上带电离子的静电势能引起的原子位移
基于单离子缺陷的发生,提出了一种新的辐射效应的明确证据,这种缺陷是通过慢速高电荷离子(例如Xe44+和U70+)的库仑势与固体绝缘表面(例如云母)的表面区域的相互作用产生的。在研究的情况下,离子的动能约为300至500 keV (~2.2 keVu),而与入射离子的静电势相关的能量接近200 keV。利用原子力显微镜研究了云母中缺陷的产生与入射离子电荷的关系。发现“泡状”缺陷的体积与入射离子电荷成正比。这些情况与慢速单电荷(Xe+)和快速(MeV) Xe17+离子的情况进行了比较。类似的缺陷也在其它绝缘子如Lexan和silica玻璃上被发现。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Surface Science
Surface Science 化学-物理:凝聚态物理
CiteScore
3.30
自引率
5.30%
发文量
137
审稿时长
25 days
期刊介绍: Surface Science is devoted to elucidating the fundamental aspects of chemistry and physics occurring at a wide range of surfaces and interfaces and to disseminating this knowledge fast. The journal welcomes a broad spectrum of topics, including but not limited to: • model systems (e.g. in Ultra High Vacuum) under well-controlled reactive conditions • nanoscale science and engineering, including manipulation of matter at the atomic/molecular scale and assembly phenomena • reactivity of surfaces as related to various applied areas including heterogeneous catalysis, chemistry at electrified interfaces, and semiconductors functionalization • phenomena at interfaces relevant to energy storage and conversion, and fuels production and utilization • surface reactivity for environmental protection and pollution remediation • interactions at surfaces of soft matter, including polymers and biomaterials. Both experimental and theoretical work, including modeling, is within the scope of the journal. Work published in Surface Science reaches a wide readership, from chemistry and physics to biology and materials science and engineering, providing an excellent forum for cross-fertilization of ideas and broad dissemination of scientific discoveries.
期刊最新文献
The electronic and optical properties of two-dimensional ice monolayer under uniaxial and biaxial strains studied by first-principles calculations Combined energy and TOF analyses of low-energy elastic recoil detection for analyzing the topmost surface of atomic deuterium-irradiated rutile TiO2(001) crystals Enhanced hydrogen evolution induced by Cl‑Coordination in Ni cluster anchored S‑vacancy MoS₂ Interlayer covalent interaction of graphene enhancing the formation of C₂ products in CO₂ reduction reaction electrocatalyzed by Cu single atom catalysts First-principles computational design of Y-WS2 monolayer for selective detection of SF6 decomposition gases toward sustainable environmental engineering applications
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1