Ion composition of beam plasma formed by electron beam evaporation of YSZ ceramic in medium vacuum

IF 3.9 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2025-04-01 Epub Date: 2025-02-01 DOI:10.1016/j.vacuum.2025.114102
D.B. Zolotukhin, A.A. Andronov, A.V. Tyunkov, Yu.G. Yushkov
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Abstract

Plasma with high content of rare-earth elements finds applications in ion implantation and surface modification technologies. Here, we have studied the mass-to-charge ion composition of multicomponent beam plasma formed by irradiation of a refractory dielectric target of zirconia ceramic partially stabilized with yttria (YSZ) by a continuous focused electron beam with energy 3–11 keV in a gas atmosphere (helium, or a mixture of helium and argon or oxygen) in the forevacuum pressure range (about 4–6 Pa). Using a quadrupole mass analyzer, we find that, at a power sufficient for intense evaporation of the target, the ion mass spectrum, in a background of residual atmosphere and operating gas ions, contains peaks of singly charged positive ions of yttrium, zirconium, and their oxides and dioxides with amplitudes comparable to those of the residual atmosphere and the operating gas, which indirectly indicates the presence of a high proportion of target material ions in the plasma. We find that signals of oxides of zirconium and yttrium ions decrease while signals of dioxides of these elements increase as the separation (along the electron beam direction) between the analyzer and the target increases. With intensive e-beam evaporation, the fraction of ions of target components surpasses the fractions of ions of all other gaseous plasma components.
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YSZ陶瓷在中真空中电子束蒸发形成束等离子体的离子组成
高稀土元素含量的等离子体在离子注入和表面改性技术中有着广泛的应用。本文研究了在真空前压力范围(约4-6 Pa)下,用能量为3-11 keV的连续聚焦电子束辐照部分用钇稳定的锆陶瓷难熔介质靶(YSZ)形成的多组分束等离子体的质荷离子组成。使用四极杆质谱分析仪,我们发现,在足够的功率下,靶物的强烈蒸发,在残余气氛和工作气体离子的背景下,离子质谱包含钇、锆及其氧化物和二氧化物的单电荷正离子峰,其振幅与残余气氛和工作气体的峰相当,这间接表明等离子体中存在高比例的目标物质离子。我们发现,随着分析仪和目标之间的分离(沿电子束方向)的增加,锆和钇离子的氧化物信号减少,而这些元素的氧化物信号增加。随着密集的电子束蒸发,目标组分的离子分数超过了所有其他气态等离子体组分的离子分数。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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