{"title":"Ion composition of beam plasma formed by electron beam evaporation of YSZ ceramic in medium vacuum","authors":"D.B. Zolotukhin, A.A. Andronov, A.V. Tyunkov, Yu.G. Yushkov","doi":"10.1016/j.vacuum.2025.114102","DOIUrl":null,"url":null,"abstract":"<div><div>Plasma with high content of rare-earth elements finds applications in ion implantation and surface modification technologies. Here, we have studied the mass-to-charge ion composition of multicomponent beam plasma formed by irradiation of a refractory dielectric target of zirconia ceramic partially stabilized with yttria (YSZ) by a continuous focused electron beam with energy 3–11 keV in a gas atmosphere (helium, or a mixture of helium and argon or oxygen) in the forevacuum pressure range (about 4–6 Pa). Using a quadrupole mass analyzer, we find that, at a power sufficient for intense evaporation of the target, the ion mass spectrum, in a background of residual atmosphere and operating gas ions, contains peaks of singly charged positive ions of yttrium, zirconium, and their oxides and dioxides with amplitudes comparable to those of the residual atmosphere and the operating gas, which indirectly indicates the presence of a high proportion of target material ions in the plasma. We find that signals of oxides of zirconium and yttrium ions decrease while signals of dioxides of these elements increase as the separation (along the electron beam direction) between the analyzer and the target increases. With intensive e-beam evaporation, the fraction of ions of target components surpasses the fractions of ions of all other gaseous plasma components.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"234 ","pages":"Article 114102"},"PeriodicalIF":3.8000,"publicationDate":"2025-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X25000922","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Plasma with high content of rare-earth elements finds applications in ion implantation and surface modification technologies. Here, we have studied the mass-to-charge ion composition of multicomponent beam plasma formed by irradiation of a refractory dielectric target of zirconia ceramic partially stabilized with yttria (YSZ) by a continuous focused electron beam with energy 3–11 keV in a gas atmosphere (helium, or a mixture of helium and argon or oxygen) in the forevacuum pressure range (about 4–6 Pa). Using a quadrupole mass analyzer, we find that, at a power sufficient for intense evaporation of the target, the ion mass spectrum, in a background of residual atmosphere and operating gas ions, contains peaks of singly charged positive ions of yttrium, zirconium, and their oxides and dioxides with amplitudes comparable to those of the residual atmosphere and the operating gas, which indirectly indicates the presence of a high proportion of target material ions in the plasma. We find that signals of oxides of zirconium and yttrium ions decrease while signals of dioxides of these elements increase as the separation (along the electron beam direction) between the analyzer and the target increases. With intensive e-beam evaporation, the fraction of ions of target components surpasses the fractions of ions of all other gaseous plasma components.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.