Research on Deterministic Ring Removal Method for Full-Aperture Double-Sided Polishing of Large Aperture Optical Components

IF 2.4 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Photonics Journal Pub Date : 2025-01-23 DOI:10.1109/JPHOT.2025.3532902
Yifan Bai;Bo Xiao;Chunyang Wang;Ke Chen;Linzhe Deng;Siling Huang;Xuelian Liu
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Abstract

To address the issues in polishing medium and large aperture optical components, which are reliant on the personal experience of processing personnel and exhibit poor controllability, this study conducted a comprehensive examination of the polishing process for these planar optical components. This article constructs a processing prediction model for large-diameter ring pendulum double-sided polishing equipment. Based on this, a simulation of the theoretical removal amount distribution of ring-pendulum double sided polishing was conducted to ascertain the relationship between various process parameters and their impact on the surface removal amount distribution of the component. Based on the obtained relationship, a decision support system for the process parameters of ring-pendulum double sided polishing was developed, which achieved the deterministic removal of rings in medium and large aperture planar optical components and reduced the dependence of ring pendulum double-sided polishing on the personal experience of process decision-makers. After experimental verification, the characteristics of the simulation results of the processing prediction model were consistent with the actual processing results. The developed process parameter decision assistance system was used to make process parameter decisions for two 430 * 430 mm fused quartz components, achieving the removal of the target ring of the components. The surface figure accuracy of the two components has been processed from 3.09λ and 3.5λ to 1.53λ and 1.79λ, respectively.
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大口径光学元件全口径双面抛光的确定性去环方法研究
针对中、大孔径光学元件抛光依赖加工人员个人经验、可控性差的问题,本研究对这类平面光学元件的抛光工艺进行了全面研究。本文建立了大直径环摆双面抛光设备的加工预测模型。在此基础上,对环摆双面抛光的理论去除量分布进行了仿真,确定了各工艺参数之间的关系及其对工件表面去除量分布的影响。在此基础上,开发了环形摆双面抛光工艺参数决策支持系统,实现了中、大孔径平面光学元件中环形的确定性去除,减少了环形摆双面抛光对工艺决策者个人经验的依赖。经实验验证,加工预测模型仿真结果的特点与实际加工结果一致。利用开发的工艺参数辅助决策系统,对两个430 * 430 mm熔融石英部件进行了工艺参数决策,实现了部件目标环的去除。两个分量的表面图形精度分别从3.09λ和3.5λ处理到1.53λ和1.79λ。
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来源期刊
IEEE Photonics Journal
IEEE Photonics Journal ENGINEERING, ELECTRICAL & ELECTRONIC-OPTICS
CiteScore
4.50
自引率
8.30%
发文量
489
审稿时长
1.4 months
期刊介绍: Breakthroughs in the generation of light and in its control and utilization have given rise to the field of Photonics, a rapidly expanding area of science and technology with major technological and economic impact. Photonics integrates quantum electronics and optics to accelerate progress in the generation of novel photon sources and in their utilization in emerging applications at the micro and nano scales spanning from the far-infrared/THz to the x-ray region of the electromagnetic spectrum. IEEE Photonics Journal is an online-only journal dedicated to the rapid disclosure of top-quality peer-reviewed research at the forefront of all areas of photonics. Contributions addressing issues ranging from fundamental understanding to emerging technologies and applications are within the scope of the Journal. The Journal includes topics in: Photon sources from far infrared to X-rays, Photonics materials and engineered photonic structures, Integrated optics and optoelectronic, Ultrafast, attosecond, high field and short wavelength photonics, Biophotonics, including DNA photonics, Nanophotonics, Magnetophotonics, Fundamentals of light propagation and interaction; nonlinear effects, Optical data storage, Fiber optics and optical communications devices, systems, and technologies, Micro Opto Electro Mechanical Systems (MOEMS), Microwave photonics, Optical Sensors.
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