Shachar Moskovich , Guy Heger , Lior Arazi , Eyal Yahel , Yuval Golan , Michael Shandalov
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引用次数: 0
Abstract
This study introduces a novel method for simulating internal radiation damage in thin films of FCC metals, utilizing small-volume electroless deposition to achieve controlled, homogenously distributed ultra-low concentrations of radioactive 228Th atoms within Ag films. We have explored the 228Th chemical state and location in the films and its effect on film morphology. The films were characterized using nuclear spectroscopy and autoradiography due to the sub-ppb to sub-ppm 228Th content, where conventional characterization methods fail due to their detection limit. We found that higher 228Th concentrations in the bath resulted, unexpectedly, in lower film activity. This study enhances our understanding of the role of Th in Ag thin film deposition and lays a foundation for future research on internal radiation damage in FCC metals, particularly focusing on the effects of recoil atoms in the films during α-emission events.
期刊介绍:
Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.