ZhiCheng Zhao , ZhuoQun Han , XiaoLi Zhang , Walther Glaubitt , Jia Liu , QingXuan Zhou , Jian Li , Ying Xu , WeiRu Zhang , Yang Wang , Ling Li , FuTian Liu
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引用次数: 0
Abstract
In the modern electronic field, micron silicon dioxide has unique advantages in electronic packaging due to its low specific surface area, low light scattering, high stability, and low interface reactions. The conventional Stöber and Seed methods are limited by submicron sizes and secondary particles, respectively, hindering the production of micron-sized silica particles in a single step. The continuous drop addition method (CAM) overcomes this limitation by changing the growth state of the particles. In this paper, monodisperse and narrowly distributed silica particles with particle sizes ranging from 0.6 μm to 0.132 μm were obtained by the continuous drop addition method. The roles of tetraethyl orthosilicate (TEOS) addition rate, TEOS concentration and ammonia solution (NH3·H2O) volume on the final particle size of silica particles were discussed.
期刊介绍:
Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.