{"title":"Progress in vacuum system design for Thailand's new light source","authors":"Thanapong Phimsen, Supan Boonsuya, Sarawut Chitthaisong, Sireegorn Sumklang, Orayanee Seegauncha, Narongsak Sonsuphap, Prapaiwan Sunwong, Supachai Prawanta, Siriwan Jummunt, Porntip Sudmuang, Prapong Klysubun","doi":"10.1016/j.vacuum.2025.114111","DOIUrl":null,"url":null,"abstract":"<div><div>The vacuum system of Siam Photon Source II (SPS-II), Thailand's first fourth-generation light source, is positioned to significantly enhance the country's local manufacturing capabilities and strengthen the Thai industrial community through technology transfer by domestically fabricating most of the main components in the system. Utilizing existing Thai expertise, conventional pumping technology is chosen. However, Design adaptations are needed to overcome the challenges posed by the dense Double-Triple Bend Achromat (DTBA) magnet lattice with limited aperture. Strategic positioning of pumps is required to achieve optimal pumping efficiency. Lump pumps are being strategically distributed throughout system. A combined approach is employed for pressure profile evaluation, using 1D iteration for the overall pressure profile with conductance values calculated from 3D Molflow + simulation, enabling optimization of the pump distribution strategy. To minimize cost and impedance, bellows are eliminated between chambers in both upstream and downstream arc sections. Finite element analysis is ongoing to ensure the modified design can withstand operational stresses. The paper concludes by outlining the overall progress and future plans for the SPS-II vacuum system design.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"234 ","pages":"Article 114111"},"PeriodicalIF":3.8000,"publicationDate":"2025-02-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X25001010","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
The vacuum system of Siam Photon Source II (SPS-II), Thailand's first fourth-generation light source, is positioned to significantly enhance the country's local manufacturing capabilities and strengthen the Thai industrial community through technology transfer by domestically fabricating most of the main components in the system. Utilizing existing Thai expertise, conventional pumping technology is chosen. However, Design adaptations are needed to overcome the challenges posed by the dense Double-Triple Bend Achromat (DTBA) magnet lattice with limited aperture. Strategic positioning of pumps is required to achieve optimal pumping efficiency. Lump pumps are being strategically distributed throughout system. A combined approach is employed for pressure profile evaluation, using 1D iteration for the overall pressure profile with conductance values calculated from 3D Molflow + simulation, enabling optimization of the pump distribution strategy. To minimize cost and impedance, bellows are eliminated between chambers in both upstream and downstream arc sections. Finite element analysis is ongoing to ensure the modified design can withstand operational stresses. The paper concludes by outlining the overall progress and future plans for the SPS-II vacuum system design.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.