Investigation of similar element selenium and tellurium volatilization behavior in the vacuum distillation separation process

IF 3.9 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2025-04-01 Epub Date: 2025-02-06 DOI:10.1016/j.vacuum.2025.114098
Xin Yu , Guozheng Zha , Wenlong Jiang , Baoqiang Xu , Dachun Liu , Bin Yang
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Abstract

Despite being an eco-friendly and efficient method for purifying crude selenium (Se) and tellurium (Te), due to their similar physical and chemical properties and the lack of the evaporation parameters of selenium during distillation cannot determine the best distillation conditions, so vacuum distillation struggles to achieve complete separation of Se and Te. This study focused on the volatilization behavior of Se and Te during vacuum distillation, using a 97%Se–3%Te alloy produced in the Se extraction industrial. The volatilization behavior of the Se–Te alloy was investigated through differential gravimetrical distillation temperatures of 523 K–723 K and system pressures of 5 Pa–1000 Pa. The results indicated that the evaporation rates of Se and Te in Se–Te alloy and the temperature exhibit an exponentially relationship, which followed the model ω = e(a+bT). Additionally, the relationship between system pressure and evaporation rate followed a logistic model ω=A2+A1A21+(pP0)b.Notably, the Te content in the volatile compounds was inversely correlated with the system pressure, thereby decreasing significantly with increasing system pressure. The mass transfer coefficient of Se in the Se–Te alloy was also determined, exhibiting a significant increase with increasing temperature and decreasing pressure. Furthermore, through comparative X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) analysis of the residual and volatiles phases. The phase of selenium and tellurium in the raw materials, residues, and volatiles remains unchanged, existing in the form of elemental selenium and tellurium, which meets the requirements of the volatilization experiments. Through experimental and data analysis, this study investigated the evaporation rates of selenium and tellurium in a selenium-tellurium alloy system and developed a fundamental model relating to pressure and temperature to obtain evaporation parameters, providing valuable insights into the volatilization behavior of Se and Te under vacuum conditions, thereby offering theoretical guidance for the vacuum distillation separation of these elements.
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真空蒸馏分离过程中相似元素硒、碲挥发行为的研究
虽然是一种环保高效的纯化粗硒(Se)和粗碲(Te)的方法,但由于两者的理化性质相近,且缺乏精馏过程中硒的蒸发参数,无法确定最佳的精馏条件,因此真空精馏难以实现Se和Te的完全分离。本文研究了真空蒸馏过程中Se和Te的挥发行为,研究对象为抽硒工业生产的97%Se-3%Te合金。通过差重蒸馏温度为523 K - 723 K,系统压力为5 Pa - 1000 Pa,研究了Se-Te合金的挥发行为。结果表明:Se - Te合金中Se和Te的蒸发速率与温度呈指数关系,符合ω = e(a+bT)模型;此外,系统压力与蒸发速率之间的关系遵循logistic模型ω=A2+A1−A21+(pP0)b。值得注意的是,挥发性化合物中的Te含量与体系压力呈负相关,随着体系压力的增加而显著降低。Se在Se - te合金中的传质系数随温度的升高和压力的降低而显著增大。此外,通过对比x射线光电子能谱(XPS)和x射线衍射(XRD)分析了残余相和挥发物相。原料、残渣、挥发物中硒、碲的物相保持不变,以元素硒、碲的形式存在,满足挥发实验的要求。本研究通过实验和数据分析,研究了硒-碲合金体系中硒和碲的蒸发速率,并建立了与压力和温度相关的基本模型,获得了蒸发参数,为了解硒和碲在真空条件下的挥发行为提供了有价值的见解,从而为真空蒸馏分离这些元素提供了理论指导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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