Erratum to "The impact of electric field strength on the accuracy of boron dopant quantification in silicon using atom probe tomography"

IF 2 3区工程技术 Q2 MICROSCOPY Ultramicroscopy Pub Date : 2025-05-01 Epub Date: 2025-02-09 DOI:10.1016/j.ultramic.2025.114115

Bavley Guerguis , Ramya Cuduvally , Richard J.H. Morris , Gabriel Arcuri , Brian Langelier , Nabil Bassim

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“电场强度对用原子探针层析法定量硅中硼掺杂的准确性的影响”的勘误。

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来源期刊

Ultramicroscopy 工程技术-显微镜技术

CiteScore

4.60

自引率

13.60%

发文量

117

审稿时长

5.3 months

期刊介绍： Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.

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