Optimization of GaN Bent Waveguides in the Visible Spectrum for Reduced Insertion Loss.

IF 4.3 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY Nanomaterials Pub Date : 2025-01-21 DOI:10.3390/nano15030151
Wendi Li, Huiping Yin, Qian Fang, Feifei Qin, Zheng Shi, Yongjin Wang, Xin Li
{"title":"Optimization of GaN Bent Waveguides in the Visible Spectrum for Reduced Insertion Loss.","authors":"Wendi Li, Huiping Yin, Qian Fang, Feifei Qin, Zheng Shi, Yongjin Wang, Xin Li","doi":"10.3390/nano15030151","DOIUrl":null,"url":null,"abstract":"<p><p>The development of GaN-based photonic integrated chips has attracted significant attention for visible light communication systems due to their direct bandgap and excellent optical properties across the visible spectrum. However, achieving compact and efficient light routing through bent waveguides remains challenging due to high insertion losses. This paper presents a comprehensive investigation of GaN bent waveguides optimization for visible light photonic integrated chips. Through systematic simulation analysis, we examined the effects of bending angle, process optimization approaches, and geometric parameters on insertion loss characteristics. The back-side thinning process demonstrates superior performance compared to front-side etching, reducing the insertion loss of 90° bends from 1.80 dB to 0.71 dB. Further optimization using silver reflection layers achieves an insertion loss of 0.57 dB. The optimized structure shows excellent performance in the blue-green spectral range (420-500 nm) with insertion losses below 0.9 dB, providing practical solutions for compact GaN photonic integrated chips in visible light communications.</p>","PeriodicalId":18966,"journal":{"name":"Nanomaterials","volume":"15 3","pages":""},"PeriodicalIF":4.3000,"publicationDate":"2025-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11820026/pdf/","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanomaterials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.3390/nano15030151","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

The development of GaN-based photonic integrated chips has attracted significant attention for visible light communication systems due to their direct bandgap and excellent optical properties across the visible spectrum. However, achieving compact and efficient light routing through bent waveguides remains challenging due to high insertion losses. This paper presents a comprehensive investigation of GaN bent waveguides optimization for visible light photonic integrated chips. Through systematic simulation analysis, we examined the effects of bending angle, process optimization approaches, and geometric parameters on insertion loss characteristics. The back-side thinning process demonstrates superior performance compared to front-side etching, reducing the insertion loss of 90° bends from 1.80 dB to 0.71 dB. Further optimization using silver reflection layers achieves an insertion loss of 0.57 dB. The optimized structure shows excellent performance in the blue-green spectral range (420-500 nm) with insertion losses below 0.9 dB, providing practical solutions for compact GaN photonic integrated chips in visible light communications.

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氮化镓弯曲波导在可见光谱中的优化以降低插入损耗。
基于gan的光子集成芯片由于其直接带隙和跨可见光谱的优异光学性能而引起了可见光通信系统的广泛关注。然而,由于高插入损耗,实现通过弯曲波导的紧凑和高效的光路由仍然具有挑战性。本文对可见光光子集成芯片的GaN弯曲波导优化进行了全面的研究。通过系统的仿真分析,研究了弯曲角度、工艺优化方法和几何参数对插入损失特性的影响。与正面蚀刻相比,背面减薄工艺表现出更好的性能,将90°弯曲的插入损耗从1.80 dB降低到0.71 dB。利用银反射层进一步优化,插入损耗达到0.57 dB。优化后的结构在蓝绿光谱范围(420 ~ 500 nm)内表现优异,插入损耗低于0.9 dB,为可见光通信中的紧凑型GaN光子集成芯片提供了实用的解决方案。
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来源期刊
Nanomaterials
Nanomaterials NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
8.50
自引率
9.40%
发文量
3841
审稿时长
14.22 days
期刊介绍: Nanomaterials (ISSN 2076-4991) is an international and interdisciplinary scholarly open access journal. It publishes reviews, regular research papers, communications, and short notes that are relevant to any field of study that involves nanomaterials, with respect to their science and application. Thus, theoretical and experimental articles will be accepted, along with articles that deal with the synthesis and use of nanomaterials. Articles that synthesize information from multiple fields, and which place discoveries within a broader context, will be preferred. There is no restriction on the length of the papers. Our aim is to encourage scientists to publish their experimental and theoretical research in as much detail as possible. Full experimental or methodical details, or both, must be provided for research articles. Computed data or files regarding the full details of the experimental procedure, if unable to be published in a normal way, can be deposited as supplementary material. Nanomaterials is dedicated to a high scientific standard. All manuscripts undergo a rigorous reviewing process and decisions are based on the recommendations of independent reviewers.
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