Experimental Evidence of Curvature Gradient Driven Domain Wall Automotion

IF 13 2区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY Small Pub Date : 2025-02-16 DOI:10.1002/smll.202407084
Eider Berganza, Felipe Tejo, Guilherme H. R. Bittencourt, Vagson L. Carvalho-Santos, Oksana Chubykalo-Fesenko, Agustina Asenjo
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Abstract

Curvature and geometry have significant implications in fundamental physics, leading to the appearance of intriguing novel phenomena. In the field of nanomagnetism, geometrical-induced effects yield important consequences, which, despite their relevance for domain wall (DW) motion-based applications, still await experimental validation. In this letter, a spiral-shaped magnetic nanostructure is used to demonstrate experimentally that curvature gradients determine DW motion. A saturating magnetic field is applied to the spirals to induce the magnetic onion state, generating head-to-head (HtH) and tail-to-tail (TtT) DW. Curvature gradient promotes domain wall motion through a local curvature-dependent effective force, toward regions of higher curvature. These effects have been studied by measuring depinning fields and supported by micromagnetic simulations and an analytical model. Our results show the potential of curvature engineering for the realization of low-energy spintronic devices.

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来源期刊
Small
Small 工程技术-材料科学:综合
CiteScore
17.70
自引率
3.80%
发文量
1830
审稿时长
2.1 months
期刊介绍: Small serves as an exceptional platform for both experimental and theoretical studies in fundamental and applied interdisciplinary research at the nano- and microscale. The journal offers a compelling mix of peer-reviewed Research Articles, Reviews, Perspectives, and Comments. With a remarkable 2022 Journal Impact Factor of 13.3 (Journal Citation Reports from Clarivate Analytics, 2023), Small remains among the top multidisciplinary journals, covering a wide range of topics at the interface of materials science, chemistry, physics, engineering, medicine, and biology. Small's readership includes biochemists, biologists, biomedical scientists, chemists, engineers, information technologists, materials scientists, physicists, and theoreticians alike.
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