Evaluation of the surface activity of silicon in electrolytic media under the influence of hydroxyl radicals

IF 4.1 3区 化学 Q1 CHEMISTRY, ANALYTICAL Journal of Electroanalytical Chemistry Pub Date : 2025-02-14 DOI:10.1016/j.jelechem.2025.119010
C. Heyser , A.M.R. Ramírez , P. Grez , E. Muñoz , A. Sáez-Arteaga , N. Briones , P. Häberle
{"title":"Evaluation of the surface activity of silicon in electrolytic media under the influence of hydroxyl radicals","authors":"C. Heyser ,&nbsp;A.M.R. Ramírez ,&nbsp;P. Grez ,&nbsp;E. Muñoz ,&nbsp;A. Sáez-Arteaga ,&nbsp;N. Briones ,&nbsp;P. Häberle","doi":"10.1016/j.jelechem.2025.119010","DOIUrl":null,"url":null,"abstract":"<div><div>The purpose of this study is to evaluate the surface activity of silicon by evaluating a voltammetric profile of the substrate in an electrolytic medium. Since the electrical current flowing through the circuit is a measure of the rate at which a redox process occurs at the interface, higher current values will indicate more active substrates. For this study, hydroxyl radicals were generated by photochemical decomposition of H<sub>2</sub>O<sub>2</sub>. For this purpose, a H<sub>2</sub>O<sub>2</sub> solution was irradiated with a UV lamp. The experimental conditions that were varied in the process were: illumination time, H<sub>2</sub>O<sub>2</sub> concentration. The presence of the hydroxyl radicals generated through the methodology employed was qualitatively confirmed by fluorescence, using for this purpose (i) a 2′,7′-dichlorodihydrofluorescein diacetate (DCFH-DA) probe and (ii) a “radical scavenger”, which corresponds to an antioxidant species, in this case ascorbic acid. On the other hand, for the voltammetric measurements of the semiconducting substrate after interaction with hydroxyl radicals, a 0,1 M KCl solution was used as electrolyte solution. The experimental conditions studied were: influence of the pH of the medium and influence of different chemical treatments applied to the substrates used after interaction with hydroxyl radicals. From the results obtained, an increase in both<sub>H2O2</sub> concentration and immersion time produces an increase in current in the interphase electrode processes, indicating an activation of the semiconductor electrode surface. Indeed, in the anodic hemicycle, the signal of substrate oxidation appears at −0,75 V, and then from −0,45 V onwards, the oxidation of water. This is an indication that the semiconductor/electrolyte interface is ohmic, since in the absence of illumination (absence of minority carriers, h<sup>+</sup>) there are oxidation processes. On the other hand, for pH values in the intervals between 2 &gt; pH &gt; 5 and 7 &gt; pH &gt; 13, the slopes are approximately 0 mV/pH and for the interval between 5 &gt; pH &gt; 7, of the order of 60 mV/pH, this being an indication of a change in the nature of the surface functional groups of silicon.</div></div>","PeriodicalId":355,"journal":{"name":"Journal of Electroanalytical Chemistry","volume":"982 ","pages":"Article 119010"},"PeriodicalIF":4.1000,"publicationDate":"2025-02-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Electroanalytical Chemistry","FirstCategoryId":"92","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1572665725000839","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, ANALYTICAL","Score":null,"Total":0}
引用次数: 0

Abstract

The purpose of this study is to evaluate the surface activity of silicon by evaluating a voltammetric profile of the substrate in an electrolytic medium. Since the electrical current flowing through the circuit is a measure of the rate at which a redox process occurs at the interface, higher current values will indicate more active substrates. For this study, hydroxyl radicals were generated by photochemical decomposition of H2O2. For this purpose, a H2O2 solution was irradiated with a UV lamp. The experimental conditions that were varied in the process were: illumination time, H2O2 concentration. The presence of the hydroxyl radicals generated through the methodology employed was qualitatively confirmed by fluorescence, using for this purpose (i) a 2′,7′-dichlorodihydrofluorescein diacetate (DCFH-DA) probe and (ii) a “radical scavenger”, which corresponds to an antioxidant species, in this case ascorbic acid. On the other hand, for the voltammetric measurements of the semiconducting substrate after interaction with hydroxyl radicals, a 0,1 M KCl solution was used as electrolyte solution. The experimental conditions studied were: influence of the pH of the medium and influence of different chemical treatments applied to the substrates used after interaction with hydroxyl radicals. From the results obtained, an increase in bothH2O2 concentration and immersion time produces an increase in current in the interphase electrode processes, indicating an activation of the semiconductor electrode surface. Indeed, in the anodic hemicycle, the signal of substrate oxidation appears at −0,75 V, and then from −0,45 V onwards, the oxidation of water. This is an indication that the semiconductor/electrolyte interface is ohmic, since in the absence of illumination (absence of minority carriers, h+) there are oxidation processes. On the other hand, for pH values in the intervals between 2 > pH > 5 and 7 > pH > 13, the slopes are approximately 0 mV/pH and for the interval between 5 > pH > 7, of the order of 60 mV/pH, this being an indication of a change in the nature of the surface functional groups of silicon.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
求助全文
约1分钟内获得全文 去求助
来源期刊
CiteScore
7.80
自引率
6.70%
发文量
912
审稿时长
2.4 months
期刊介绍: The Journal of Electroanalytical Chemistry is the foremost international journal devoted to the interdisciplinary subject of electrochemistry in all its aspects, theoretical as well as applied. Electrochemistry is a wide ranging area that is in a state of continuous evolution. Rather than compiling a long list of topics covered by the Journal, the editors would like to draw particular attention to the key issues of novelty, topicality and quality. Papers should present new and interesting electrochemical science in a way that is accessible to the reader. The presentation and discussion should be at a level that is consistent with the international status of the Journal. Reports describing the application of well-established techniques to problems that are essentially technical will not be accepted. Similarly, papers that report observations but fail to provide adequate interpretation will be rejected by the Editors. Papers dealing with technical electrochemistry should be submitted to other specialist journals unless the authors can show that their work provides substantially new insights into electrochemical processes.
期刊最新文献
Editorial Board Ti3C2Tx MXene-based (Cobalt–Vanadium) bimetallic sulfides 0D@2D heterostructure composite for asymmetric supercapacitor application Simulation of cyclic voltammograms for 3D diffusion-controlled growth and dissolution of new phase nuclei Evaluation of the surface activity of silicon in electrolytic media under the influence of hydroxyl radicals Electrochemical characterization of reduced TiO2 thin films in acetonitrile electrolytes
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1