Influence of the Forgetting Factor in the Recursive Least Squares RLS Algorithm on the Quality and Precision of the Identified Parameters in a DC Corona Discharge

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS IEEE Transactions on Plasma Science Pub Date : 2025-01-17 DOI:10.1109/TPS.2024.3524470
Tahtah Abdelkarim;Raouti Driss;Olivier Eichwald;Lionel Vido;Nassour Kamel;Bouanane Abdelkrim
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Abstract

In this work, we present a contribution on the applicability of the recursive least squares method used for the parametric identification of a corona discharge phenomenon at small distances. Furthermore, we show the influence of the choice of the forgetting factor for a better performance of the identification operation and the quality of estimation of the identified parameters. The identification process is based on experimental input/output measurements. The validation of the parameter results is done by a physical analysis of the behaviors of these parameters and by comparing the output calculated according to these parameters, with the real output obtained experimentally. The results show that with a constant forgetting factor close to 1 ( $\lambda = 0.99$ ), parameter quality improves but output accuracy may vary. In contrast, a variable forgetting factor enhances both parameter quality and model output consistently. A good agreement observed between the real and calculated outputs confirms both the good choice of the forgetting factor and the precision of the estimated parameters as well as the validity of the identified model in general.
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在这项工作中,我们介绍了递归最小二乘法在小距离电晕放电现象参数识别中的适用性。此外,我们还展示了遗忘因子的选择对提高识别操作性能和识别参数估计质量的影响。识别过程以实验输入/输出测量为基础。参数结果的验证是通过对这些参数的行为进行物理分析,并将根据这些参数计算出的输出与实验获得的实际输出进行比较来完成的。结果表明,在遗忘因子接近 1 的恒定条件下($\lambda = 0.99$),参数质量有所改善,但输出精度可能会有变化。相反,如果遗忘因子可变,则参数质量和模型输出都会得到一致提高。实际输出与计算输出之间的良好一致性证实了遗忘因子的良好选择、估计参数的精确性以及所确定模型的总体有效性。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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IEEE Transactions on Plasma Science Information for Authors Editorial IEEE Transactions on Plasma Science Publication Information Table of Contents Reviewer Summary for Transactions on Plasma Science
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