{"title":"Empowering TiO2:ZrO2 composite for energy storage through chemical beam vapor deposition","authors":"Md Kashif Shamim , William Maudez , Estelle Wagner , Seema Sharma , Radheshyam Rai , Giacomo Benvenuti , Rashmi Rani","doi":"10.1016/j.tsf.2025.140628","DOIUrl":null,"url":null,"abstract":"<div><div>Nanocomposite TiO<sub>2</sub>:ZrO<sub>2</sub> thin films were deposited using the Chemical Beam Vapour Deposition technique with a combinatorial approach, allowing for rapid scanning of multiple parameters on a single substrate. The films were carefully studied for their structural, morphological, and dielectric properties with respect to different element compositions (∼80:20, ∼70:30, and ∼60:40 (Ti:Zr) atomic %). The X-ray diffraction measurements showed the presence of TiO<sub>2</sub> anatase phase, ZrO<sub>2</sub> tetragonal phase and ZrTiO<sub>4</sub> orthorhombic phase, which was further confirmed by Raman analysis. Atomic Force Microscopy and Field Emission Scanning Electron Microscopy revealed homogeneous morphology for all the composite films. Notably, the ∼60:40 (Ti:Zr) atomic %) nanocomposite thin film exhibited a high dielectric constant (up to ∼73), high ionic conductivity (up to 10<sup>–1</sup> S/cm), and low leakage current density (down to ∼4.4 × 10<sup>–7</sup> A/cm<sup>2</sup> at 1.2 V), making it an attractive material for energy storage applications in the future.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"815 ","pages":"Article 140628"},"PeriodicalIF":2.0000,"publicationDate":"2025-02-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Solid Films","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S004060902500029X","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0
Abstract
Nanocomposite TiO2:ZrO2 thin films were deposited using the Chemical Beam Vapour Deposition technique with a combinatorial approach, allowing for rapid scanning of multiple parameters on a single substrate. The films were carefully studied for their structural, morphological, and dielectric properties with respect to different element compositions (∼80:20, ∼70:30, and ∼60:40 (Ti:Zr) atomic %). The X-ray diffraction measurements showed the presence of TiO2 anatase phase, ZrO2 tetragonal phase and ZrTiO4 orthorhombic phase, which was further confirmed by Raman analysis. Atomic Force Microscopy and Field Emission Scanning Electron Microscopy revealed homogeneous morphology for all the composite films. Notably, the ∼60:40 (Ti:Zr) atomic %) nanocomposite thin film exhibited a high dielectric constant (up to ∼73), high ionic conductivity (up to 10–1 S/cm), and low leakage current density (down to ∼4.4 × 10–7 A/cm2 at 1.2 V), making it an attractive material for energy storage applications in the future.
期刊介绍:
Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.