Ciprofloxacin removal as an emerging contaminant using electrochemical advanced reduction process: Mechanism, degradation pathway and reaction kinetic

IF 5.9 3区 工程技术 Q1 CHEMISTRY, MULTIDISCIPLINARY Journal of Industrial and Engineering Chemistry Pub Date : 2025-05-25 Epub Date: 2024-10-28 DOI:10.1016/j.jiec.2024.10.039
Mahdi Safdari , Mohammad Mahdi Emamjomeh , Abbas Rezaee
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Abstract

The introduction of emerging contaminants (ECs), particularly antibiotics to the water resources has grown in recent years. Due to its widespread application and their toxicity, the ECs are one of the major environmental concerns. The present study is to evaluate the electrochemical removal of ciprofloxacin (CIP) as an emerging contaminant through the advanced reduction process (ARP). Moreover, the degradation pathway, mechanism and its kinetics have provided. In this study, the impacts of main operating variables were evaluated including pH, current density, initial pollutant concentration, sodium sulfite (Na2SO3) concentration, and time on the CIP removal through electrochemical process based-ARP. The obtained results revealed the 94.15 % CIP degradation rate under optimal conditions, at the concentration of 20 mg/L and pH 5 during 60 min. The CIP reduction followed the first-order kinetics with the rate of 0.99. In addition, the ARP along with electrochemical systems as a novel process were suggested as suitable and high efficiency technique for the CIP removal.

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电化学高级还原法去除新型污染物环丙沙星:机理、降解途径及反应动力学
近年来,新出现的污染物(ECs),特别是抗生素对水资源的影响越来越大。由于其广泛的应用及其毒性,ECs已成为主要的环境问题之一。本文研究了先进还原工艺(ARP)对环丙沙星(CIP)的电化学去除效果。并对其降解途径、机理和动力学进行了研究。考察了pH、电流密度、初始污染物浓度、亚硫酸钠(Na2SO3)浓度、时间等主要操作变量对基于arp的电化学工艺去除CIP的影响。结果表明,在pH为5、浓度为20 mg/L、反应时间为60 min的最佳条件下,CIP的降解率为94.15%,符合一级动力学,速率为0.99。此外,ARP联合电化学系统作为一种新型的高效去除CIP的技术也被提出。
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来源期刊
CiteScore
10.40
自引率
6.60%
发文量
639
审稿时长
29 days
期刊介绍: Journal of Industrial and Engineering Chemistry is published monthly in English by the Korean Society of Industrial and Engineering Chemistry. JIEC brings together multidisciplinary interests in one journal and is to disseminate information on all aspects of research and development in industrial and engineering chemistry. Contributions in the form of research articles, short communications, notes and reviews are considered for publication. The editors welcome original contributions that have not been and are not to be published elsewhere. Instruction to authors and a manuscript submissions form are printed at the end of each issue. Bulk reprints of individual articles can be ordered. This publication is partially supported by Korea Research Foundation and the Korean Federation of Science and Technology Societies.
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