Preparation, microstructure and properties of FeCrAlTiSi high entropy alloy coatings using the combined technique of magnetron sputtering with multiarc ion plating

IF 3.9 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2025-06-01 Epub Date: 2025-02-20 DOI:10.1016/j.vacuum.2025.114161

Li Zuo , Qi Gao , Yi-Cun Xu , Zuo-Ming Xie , Lin-Chao Zhang , Rui Liu , Li-Long Pang , Zhi-Guang Wang , Gai-Ling Lu , Jun-Feng Yang

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Abstract

In this work, FeCrAlTiSi high-entropy alloy coatings (HEACs) were prepared using magnetron sputtering (MS) under various substrate biases with a Ti interlayer pre-deposited through multiarc ion plating (M-AIP) to enhance the coating/substrate adhesion strength. The morphology, microstructure, elemental and phase composition, nanohardness, Young's modulus, adhesion strength and corrosion resistance were characterized using SEM, XRD, TEM, XPS, nanoindenter, scratch tester and electrochemical workstation. Results indicated that all FeCrAlTiSi coatings were in an amorphous state. Nanohardness and Young's modulus had a strong substrate bias dependence, reaching the maximum of 16.04 GPa and 241.3 GPa, respectively, at −100 V bias. Meanwhile, FeCrAlSiTi coatings at −100 V exhibited superior corrosion resistance to that of 316L in 3.5 wt% NaCl aqueous solution, about 60 times improvement in terms of corrosion current density owing to the combined effect of homogeneous composition distribution, amorphous structure, and chemically stable oxide film predominantly composed of Al₂O₃, TiO₂ and SiO₂.

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磁控溅射与多弧离子镀相结合技术制备FeCrAlTiSi高熵合金镀层及其显微组织与性能

本文采用磁控溅射（MS）技术，在不同的衬底偏压下制备了FeCrAlTiSi高熵合金涂层（HEACs），并通过多弧离子镀（M-AIP）预镀Ti中间层，以提高涂层与衬底的结合强度。采用SEM、XRD、TEM、XPS、纳米压痕机、划痕测试仪和电化学工作站对材料的形貌、微观结构、元素和相组成、纳米硬度、杨氏模量、粘附强度和耐蚀性进行了表征。结果表明，所有FeCrAlTiSi涂层均处于非晶态。纳米硬度和杨氏模量对衬底偏压有很强的依赖性，在−100 V偏压下分别达到最大值16.04 GPa和241.3 GPa。同时，在−100 V条件下，FeCrAlSiTi涂层在3.5 wt% NaCl水溶液中的耐蚀性优于316L涂层，腐蚀电流密度提高了约60倍，这是由于成分分布均匀、非晶结构和化学稳定的氧化膜主要由Al2O3、TiO2和SiO2组成。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.