Preparation, microstructure and properties of FeCrAlTiSi high entropy alloy coatings using the combined technique of magnetron sputtering with multiarc ion plating
Li Zuo , Qi Gao , Yi-Cun Xu , Zuo-Ming Xie , Lin-Chao Zhang , Rui Liu , Li-Long Pang , Zhi-Guang Wang , Gai-Ling Lu , Jun-Feng Yang
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引用次数: 0
Abstract
In this work, FeCrAlTiSi high-entropy alloy coatings (HEACs) were prepared using magnetron sputtering (MS) under various substrate biases with a Ti interlayer pre-deposited through multiarc ion plating (M-AIP) to enhance the coating/substrate adhesion strength. The morphology, microstructure, elemental and phase composition, nanohardness, Young's modulus, adhesion strength and corrosion resistance were characterized using SEM, XRD, TEM, XPS, nanoindenter, scratch tester and electrochemical workstation. Results indicated that all FeCrAlTiSi coatings were in an amorphous state. Nanohardness and Young's modulus had a strong substrate bias dependence, reaching the maximum of 16.04 GPa and 241.3 GPa, respectively, at −100 V bias. Meanwhile, FeCrAlSiTi coatings at −100 V exhibited superior corrosion resistance to that of 316L in 3.5 wt% NaCl aqueous solution, about 60 times improvement in terms of corrosion current density owing to the combined effect of homogeneous composition distribution, amorphous structure, and chemically stable oxide film predominantly composed of Al2O3, TiO2 and SiO2.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.