A molecular dynamic study on liquid droplet evaporation under low atmospheric pressure conditions

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2025-02-19 DOI:10.1016/j.vacuum.2025.114156
Zhijun Tian , Yanfeng Liu
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Abstract

Evaporation at high altitudes under low atmospheric pressure has garnered significant attention due to its distinct behavior compared to standard pressures. To address the effects of atmospheric pressure, molecular dynamics simulations are conducted on liquid droplets under three different conditions: 0.1 bar, 0.5 bar, and 1 bar. The temporal evolution of macroscopic parameters and the spatiotemporal dynamics of the liquid droplet are analyzed. The results show that reduced interactions, due to the low number density of nitrogen particles, lead to lower heat absorption by the liquid and a thinner liquid-gas interface, resulting in a lower evaporation rate at low atmospheric pressure. An increased initial evaporation rate at 0.1 bar is observed, resembling evaporation into a vacuum. The discrepancy between the D2 law and the MD results increases as the vacuum degree rises, suggesting that the D2 law is not suitable for predicting droplet evaporation behavior under low atmospheric pressure conditions. This work provides a fundamental reference for the design of evaporative cooling systems in high-altitude, low-atmospheric-pressure environments.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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