Impact of distributed Bragg reflectors on the intrinsic detection efficiency of superconducting nanowire single-photon detectors

IF 5.6 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Superconductivity Pub Date : 2025-03-01 DOI:10.1016/j.supcon.2025.100152

Hongxin Xu , Hailong Han , You Xiao , Jiamin Xiong , Chaomeng Ding , Zhiyun Shu , Yuchi Li , Xiaoyu Liu , Lixing You , Zhen Wang , Hao Li

{"title":"Impact of distributed Bragg reflectors on the intrinsic detection efficiency of superconducting nanowire single-photon detectors","authors":"Hongxin Xu , Hailong Han , You Xiao , Jiamin Xiong , Chaomeng Ding , Zhiyun Shu , Yuchi Li , Xiaoyu Liu , Lixing You , Zhen Wang , Hao Li","doi":"10.1016/j.supcon.2025.100152","DOIUrl":null,"url":null,"abstract":"<div><div>In this study, we investigate the impact of substrates with distributed Bragg reflectors (DBRs) on the proximity effect during the fabrication of superconducting nanowire single-photon detectors (SNSPDs) using electron beam lithography. We compare the linewidth compression and line edge roughness of nanowires prepared on three different DBRs substrates. Additionally, we characterize the variations in switching current (I<span><math><msub><mrow></mrow><mrow><mi>s</mi><mi>w</mi></mrow></msub></math></span>) and intrinsic detection efficiency (IDE) at a 2.2-K temperature. The results show that when the substrates are composed of low atomic number materials, such as Si and SiO<sub>2</sub>, the proximity effect is significantly mitigated. As a consequence, the lithography quality of nanowires is effectively improved, thus enhancing the IDE of SNSPDs. This study is expected to provide new insights into the fabrication of SNSPDs and lay the foundation for the preparation of high-performance and high-uniformity large-area devices.</div></div>","PeriodicalId":101185,"journal":{"name":"Superconductivity","volume":"13 ","pages":"Article 100152"},"PeriodicalIF":5.6000,"publicationDate":"2025-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Superconductivity","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2772830725000031","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}

引用次数: 0

Abstract

In this study, we investigate the impact of substrates with distributed Bragg reflectors (DBRs) on the proximity effect during the fabrication of superconducting nanowire single-photon detectors (SNSPDs) using electron beam lithography. We compare the linewidth compression and line edge roughness of nanowires prepared on three different DBRs substrates. Additionally, we characterize the variations in switching current (I

_{s w}

) and intrinsic detection efficiency (IDE) at a 2.2-K temperature. The results show that when the substrates are composed of low atomic number materials, such as Si and SiO₂, the proximity effect is significantly mitigated. As a consequence, the lithography quality of nanowires is effectively improved, thus enhancing the IDE of SNSPDs. This study is expected to provide new insights into the fabrication of SNSPDs and lay the foundation for the preparation of high-performance and high-uniformity large-area devices.

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

求助全文

约1分钟内获得全文去求助

来源期刊

Superconductivity

CiteScore

3.90

自引率

0.00%

发文量