Double-Heterojunction-Based HgTe Colloidal Quantum Dot Imagers

IF 16 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY ACS Nano Pub Date : 2025-02-27 DOI:10.1021/acsnano.4c17257
Huicheng Hu, Jing Liu, Jing Liu, Mohan Yuan, Haifei Ma, Binbin Wang, Ya Wang, Hang Xia, Junrui Yang, Liang Gao, Jianbing Zhang, Jiang Tang, Xinzheng Lan
{"title":"Double-Heterojunction-Based HgTe Colloidal Quantum Dot Imagers","authors":"Huicheng Hu, Jing Liu, Jing Liu, Mohan Yuan, Haifei Ma, Binbin Wang, Ya Wang, Hang Xia, Junrui Yang, Liang Gao, Jianbing Zhang, Jiang Tang, Xinzheng Lan","doi":"10.1021/acsnano.4c17257","DOIUrl":null,"url":null,"abstract":"Photodetectors based on HgTe colloidal quantum dots (CQDs) are expected to enable the next generation of infrared detection technology due to their low-cost preparation, widely tunable absorption, and direct integration with Si-based electronics. However, the fabrication of HgTe CQD photodiode focal plane arrays (FPAs) has been hampered by the creation of rectifying homojunctions through delicate doping modulation and the time-consuming layer-by-layer assembly of the QD photoactive layer. Herein we address these challenges by exploring energetically favored ZnO/HgTe/ZnTe double heterojunctions (DH), and by forming colloidally stable HgTe ink that enables one-step direct film deposition. The DH HgTe CQD photodiode operates over a broad spectral range from 400 to 1800 nm, comparable to that of uncooled InGaAs detectors, with a record peak EQE of 56% at 1600 nm. A short-wave infrared (SWIR) imager has been finally demonstrated through monolithic integration with a CMOS readout integrated circuit (ROIC) comprising 640 × 512 pixels. The DH architecture is beneficial for the construction of high-performance HgTe CQD photodiodes compatible with silicon chip integration.","PeriodicalId":21,"journal":{"name":"ACS Nano","volume":"7 1","pages":""},"PeriodicalIF":16.0000,"publicationDate":"2025-02-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Nano","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1021/acsnano.4c17257","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

Photodetectors based on HgTe colloidal quantum dots (CQDs) are expected to enable the next generation of infrared detection technology due to their low-cost preparation, widely tunable absorption, and direct integration with Si-based electronics. However, the fabrication of HgTe CQD photodiode focal plane arrays (FPAs) has been hampered by the creation of rectifying homojunctions through delicate doping modulation and the time-consuming layer-by-layer assembly of the QD photoactive layer. Herein we address these challenges by exploring energetically favored ZnO/HgTe/ZnTe double heterojunctions (DH), and by forming colloidally stable HgTe ink that enables one-step direct film deposition. The DH HgTe CQD photodiode operates over a broad spectral range from 400 to 1800 nm, comparable to that of uncooled InGaAs detectors, with a record peak EQE of 56% at 1600 nm. A short-wave infrared (SWIR) imager has been finally demonstrated through monolithic integration with a CMOS readout integrated circuit (ROIC) comprising 640 × 512 pixels. The DH architecture is beneficial for the construction of high-performance HgTe CQD photodiodes compatible with silicon chip integration.

Abstract Image

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
基于双异质结的碲镉汞胶体量子点成像仪
基于HgTe胶体量子点(CQDs)的光电探测器由于其制备成本低、吸收可广泛调谐以及与硅基电子器件直接集成,有望实现下一代红外探测技术。然而,HgTe CQD光电二极管焦平面阵列(fpa)的制造一直受到通过精细掺杂调制产生整流同质结和耗时的QD光活性层逐层组装的阻碍。在这里,我们通过探索能量有利的ZnO/HgTe/ZnTe双异质结(DH)来解决这些挑战,并通过形成胶体稳定的HgTe墨水来实现一步直接薄膜沉积。DH HgTe CQD光电二极管工作在400 ~ 1800 nm的宽光谱范围内,与未冷却的InGaAs探测器相当,在1600 nm处EQE峰值达到56%。通过与640 × 512像素的CMOS读出集成电路(ROIC)的单片集成,最终演示了短波红外(SWIR)成像仪。该结构有利于构建与硅芯片集成兼容的高性能HgTe CQD光电二极管。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
文献相关原料
公司名称
产品信息
阿拉丁
Zinc telluride
阿拉丁
Methanol
阿拉丁
Ethanol
阿拉丁
Octane
阿拉丁
Lithium bis(trimethylsilyl)amide
阿拉丁
Trioctylphosphine
阿拉丁
Oleylamine
来源期刊
ACS Nano
ACS Nano 工程技术-材料科学:综合
CiteScore
26.00
自引率
4.10%
发文量
1627
审稿时长
1.7 months
期刊介绍: ACS Nano, published monthly, serves as an international forum for comprehensive articles on nanoscience and nanotechnology research at the intersections of chemistry, biology, materials science, physics, and engineering. The journal fosters communication among scientists in these communities, facilitating collaboration, new research opportunities, and advancements through discoveries. ACS Nano covers synthesis, assembly, characterization, theory, and simulation of nanostructures, nanobiotechnology, nanofabrication, methods and tools for nanoscience and nanotechnology, and self- and directed-assembly. Alongside original research articles, it offers thorough reviews, perspectives on cutting-edge research, and discussions envisioning the future of nanoscience and nanotechnology.
期刊最新文献
Atomic Displacements Drive Flat Band Formation and Lateral Electron and Hole Separation in Near-60° Twisted MoSe2/WSe2 Bilayers. Cationic Polymer–Photothermal Agent Conjugates with Enhanced Light Absorption and Tumor Accumulation for Efficient Phototherapy of Osteosarcoma Engineering Asymmetric Active Sites with Spin Polarization for Selective Photocatalytic CO2-to-CH3COOH Conversion Nanotrap–AI Integration Enables Ultra-Sensitive Point-of-Care HIV Testing Precise Engineering of Cobalt Sites on Strained TiO2–x Enables Tunable Syngas Production via Photocatalytic CO2 and Water Conversion
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1