On the microstructure, electrochemical properties, biocompatibility, and cytotoxicity of TiAlFeCoX (X=Ni, Cu) high-entropy alloy thin films, deposited by DC magnetron sputtering

IF 4.7 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Chemistry and Physics Pub Date : 2025-02-25 DOI:10.1016/j.matchemphys.2025.130617
Ehsan Heidari, Shima Moazami, Abbas Bahrami, Sima Torkian
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Abstract

This study investigates the microstructure, corrosion behavior, biocompatibility, and cytotoxicity of TiAlFeCoNi and TiAlFeCoCu high-entropy alloy thin films, deposited on AISI 316L stainless steel by direct current magnetron sputtering. Grazing incidence X-ray diffraction (GIXRD), electron microscope, potentiodynamic polarization, and electrochemical impedance spectroscopy (EIS) were used to investigate microstructural and electrochemical properties of deposited thin films. GIXRD and FE-SEM results showed that elements are homogenously distributed in the coating layers and that the coatings have amorphous structure. The potentiodynamic polarization results suggests that both compositions have improved the corrosion resistance of the base alloy. In vitro biomineralization test showed that both compositions are indeed bioactive, given that crystals of hydroxyapatite were formed on both coatings after 7 days of immersion in the simulated body fluid (SBF), as opposed to the stainless-steel substrate which did not show any noticeable bioactivity. Cytotoxicity assessments showed that the TiAlFeCoNi coating has comparatively much higher cell viability. Overall, TiAlFeCoNi appears to be a very promising coating for biomedical applications.
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直流磁控溅射法制备TiAlFeCoX (X=Ni, Cu)高熵合金薄膜的微观结构、电化学性能、生物相容性和细胞毒性
本文研究了采用直流磁控溅射技术在AISI 316L不锈钢表面沉积TiAlFeCoNi和TiAlFeCoCu高熵合金薄膜的微观结构、腐蚀行为、生物相容性和细胞毒性。利用掠入射x射线衍射(GIXRD)、电子显微镜、动电位极化和电化学阻抗谱(EIS)研究了沉积薄膜的微观结构和电化学性能。GIXRD和FE-SEM结果表明,镀层中元素分布均匀,具有非晶结构。动电位极化结果表明,两种成分均能提高基体合金的耐蚀性。体外生物矿化试验表明,这两种组合物在模拟体液(SBF)中浸泡7天后,在两种涂层上都形成了羟基磷灰石晶体,而不锈钢衬底则没有表现出任何明显的生物活性。细胞毒性评价表明,TiAlFeCoNi涂层具有较高的细胞活力。总的来说,TiAlFeCoNi似乎是一种非常有前途的生物医学应用涂层。
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来源期刊
Materials Chemistry and Physics
Materials Chemistry and Physics 工程技术-材料科学:综合
CiteScore
8.70
自引率
4.30%
发文量
1515
审稿时长
69 days
期刊介绍: Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.
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