Gain–Bandwidth Product Optimization of Short-Wavelength Infrared HgCdTe e-Avalanche Photodiodes

IF 3.2 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Transactions on Electron Devices Pub Date : 2025-02-04 DOI:10.1109/TED.2025.3534747
Wenrui Wei;Qing Li;Zhuangzhuang Xu;Jiachang Chen;Lu Chen;Huijun Guo;Peng Wang;Weida Hu
{"title":"Gain–Bandwidth Product Optimization of Short-Wavelength Infrared HgCdTe e-Avalanche Photodiodes","authors":"Wenrui Wei;Qing Li;Zhuangzhuang Xu;Jiachang Chen;Lu Chen;Huijun Guo;Peng Wang;Weida Hu","doi":"10.1109/TED.2025.3534747","DOIUrl":null,"url":null,"abstract":"The short-wave infrared (SWIR) HgCdTe avalanche photodiodes (APDs) have demonstrated promising applications in low-flux and high-speed optical communication systems at high temperatures. However, the big gap between the theoretical highest gain-bandwidth product (GBP) and the reported performances indicates that there is still room for device optimization. In this work, numerical models were established for the 3-<inline-formula> <tex-math>$\\mu $ </tex-math></inline-formula>m cutoff wavelength SWIR HgCdTe electron-initiated APDs (e-APDs) working at 140 K. The absorption and multiplication layer thickness dependence of the impulse response and multiplication gain has been characterized. Our results show that a thinner absorption and multiplication layer will enhance the bandwidth performance, and a mesa structure device can achieve a higher bandwidth compared to a planar one. The tradeoff between the bandwidth and multiplication gain was analyzed to optimize the GBP of the device. The structural optimization increases the device bandwidth from 300 to 750 MHz and achieved a 21-GHz GBP at 16 V bias. Specially, the high GBP and ability to maintain a low excess noise factor make HgCdTe APDs extremely valuable for high-quality signal transmission applications.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 3","pages":"1254-1258"},"PeriodicalIF":3.2000,"publicationDate":"2025-02-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10870284/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

The short-wave infrared (SWIR) HgCdTe avalanche photodiodes (APDs) have demonstrated promising applications in low-flux and high-speed optical communication systems at high temperatures. However, the big gap between the theoretical highest gain-bandwidth product (GBP) and the reported performances indicates that there is still room for device optimization. In this work, numerical models were established for the 3- $\mu $ m cutoff wavelength SWIR HgCdTe electron-initiated APDs (e-APDs) working at 140 K. The absorption and multiplication layer thickness dependence of the impulse response and multiplication gain has been characterized. Our results show that a thinner absorption and multiplication layer will enhance the bandwidth performance, and a mesa structure device can achieve a higher bandwidth compared to a planar one. The tradeoff between the bandwidth and multiplication gain was analyzed to optimize the GBP of the device. The structural optimization increases the device bandwidth from 300 to 750 MHz and achieved a 21-GHz GBP at 16 V bias. Specially, the high GBP and ability to maintain a low excess noise factor make HgCdTe APDs extremely valuable for high-quality signal transmission applications.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
短波红外HgCdTe雪崩光电二极管增益带宽积优化
短波红外(SWIR) HgCdTe雪崩光电二极管(apd)在高温下的低通量和高速光通信系统中表现出了良好的应用前景。然而,理论最高增益带宽积(GBP)与报告性能之间的巨大差距表明设备仍有优化的空间。在这项工作中,建立了在140 K下工作的3- $\mu $ m截止波长SWIR HgCdTe电子引发apd (e- apd)的数值模型。研究了脉冲响应和倍增增益与吸收层和倍增层厚度的关系。研究结果表明,更薄的吸收倍增层可以提高带宽性能,并且与平面结构器件相比,平台结构器件可以获得更高的带宽。分析了带宽和倍增增益之间的权衡,以优化器件的GBP。结构优化将器件带宽从300 MHz提高到750 MHz,并在16 V偏置下实现了21 ghz的GBP。特别是,高GBP和保持低多余噪声因子的能力使HgCdTe apd在高质量信号传输应用中非常有价值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
期刊最新文献
Bias-Dependent Trap Characterization in Hydrogen-Terminated Diamond MOSFETs Using Transient Current Analysis Trap-Induced Instability in β-Ga2O3 Solar-Blind Phototransistors Under Electro-Optical Stress The Abnormal Effective Mobility Enhancement for FeFET With Cycling From the Polarization Switching-Induced Interface Charge Compensation Bias-Polarity-Dependent Electrical Characteristics of 1x nm DRAM Capacitors for Robust Cryogenic Memory Applications IEEE Transactions on Electron Devices Information for Authors
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1