Treatment of real pharmaceutical industry wastewater by photo-Fenton oxidation using the response surface methodology, evaluation of diclofenac degradation and toxicity

IF 5.1 2区工程技术 Q1 ENGINEERING, MULTIDISCIPLINARY Engineering Science and Technology-An International Journal-Jestech Pub Date : 2025-03-03 DOI:10.1016/j.jestch.2025.102004

Ender Öztürk , Ayşe Elif Ateş , Hüseyin Selçuk , Sinan Ateş

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Abstract

Discharges from domestic, hospital, and pharmaceutical industry wastewater have been identified as the main sources of pharmaceuticals in the environment. Many studies focused on the removal of pharmaceuticals from hospitals and domestic wastewater. However, the number of studies that evaluated the treatment of real pharmaceutical wastewater and its detoxification after treatment is limited in literature. This study evaluated the treatment of real pharmaceutical wastewater by photo-Fenton oxidation using response surface methodology (RSM) and its toxicity with Daphnia magna according to process conditions after treatment. The removal efficiencies were read on 3D graphics to determine the optimum conditions more clearly. Diclofenac (DCF), Daphnia magna toxicity, total organic carbon (TOC), and color parameters were followed to evaluate the treatment efficiency of the photo-Fenton oxidation. The developed RSM model with the quartic formula was found to be suitable for TOC and color removal from pharmaceutical wastewater by solar photo-Fenton oxidation. At optimum conditions of pH 2,87, 0,297 g FeSO₄/L, and 4,38 g H₂O₂/L for 101 min, >99 % DCF, 94 % TOC, and 81 % color removal efficiencies were achieved by photo-Fenton oxidation. Moreover, the toxicity of the raw wastewater, as indicated by an LD50 value of 20 %, was substantially reduced post-treatment, with the LD50 value increasing to 90 % following the application of photo-Fenton oxidation.

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来源期刊

Engineering Science and Technology-An International Journal-Jestech Materials Science-Electronic, Optical and Magnetic Materials

CiteScore

11.20

自引率

3.50%

发文量

153

审稿时长

22 days

期刊介绍： Engineering Science and Technology, an International Journal (JESTECH) (formerly Technology), a peer-reviewed quarterly engineering journal, publishes both theoretical and experimental high quality papers of permanent interest, not previously published in journals, in the field of engineering and applied science which aims to promote the theory and practice of technology and engineering. In addition to peer-reviewed original research papers, the Editorial Board welcomes original research reports, state-of-the-art reviews and communications in the broadly defined field of engineering science and technology. The scope of JESTECH includes a wide spectrum of subjects including: -Electrical/Electronics and Computer Engineering (Biomedical Engineering and Instrumentation; Coding, Cryptography, and Information Protection; Communications, Networks, Mobile Computing and Distributed Systems; Compilers and Operating Systems; Computer Architecture, Parallel Processing, and Dependability; Computer Vision and Robotics; Control Theory; Electromagnetic Waves, Microwave Techniques and Antennas; Embedded Systems; Integrated Circuits, VLSI Design, Testing, and CAD; Microelectromechanical Systems; Microelectronics, and Electronic Devices and Circuits; Power, Energy and Energy Conversion Systems; Signal, Image, and Speech Processing) -Mechanical and Civil Engineering (Automotive Technologies; Biomechanics; Construction Materials; Design and Manufacturing; Dynamics and Control; Energy Generation, Utilization, Conversion, and Storage; Fluid Mechanics and Hydraulics; Heat and Mass Transfer; Micro-Nano Sciences; Renewable and Sustainable Energy Technologies; Robotics and Mechatronics; Solid Mechanics and Structure; Thermal Sciences) -Metallurgical and Materials Engineering (Advanced Materials Science; Biomaterials; Ceramic and Inorgnanic Materials; Electronic-Magnetic Materials; Energy and Environment; Materials Characterizastion; Metallurgy; Polymers and Nanocomposites)