The interfacial reaction process and phase formation mechanism between the nickel-based superalloy and the SiO2 crucible during vacuum induction melting

IF 3.9 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2025-02-25 DOI:10.1016/j.vacuum.2025.114178
Jinhong Zhang , Jun Wang , Haoxue Yang , Liting Liu , Guodong Zhang , Fasong Cheng , Jinshan Li
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Abstract

This work investigated the interfacial reactions between Ni-based superalloys and SiO2 crucibles during vacuum induction melting. Through thermodynamic and kinetic analyses of the interfacial reactions, the underlying mechanisms of the interactions at the superalloy/SiO2 interface are elucidated. The interfacial reactions are facilitated by elemental diffusion at the interface. The Al atoms in the alloy preferentially diffuse to the interface, where they react with O atoms diffusing from the crucible to form Al2O3. The initially formed Al2O3 serves as heterogeneous nucleation sites for TiC. Consequently, a continuous and uniform Al2O3 layer, along with a discontinuous TiC layer, formed at the superalloy/SiO2 interface. Transmission electron microscopy (TEM) analysis confirmed the orientation relationship between the TiC and the superalloy matrix as [011]TiC//[112]γ, indicating that the TiC precipitates from the alloy matrix. A simplified two-factor analysis of variance (ANOVA) of the interfacial reaction layer thickness data reveals that within the temperature range slightly above the melting point of the superalloy, the melting time is the primary factor that significantly affects the thickness of the interfacial reaction layer.
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真空感应熔炼过程中镍基超合金与二氧化硅坩埚之间的界面反应过程和相形成机制
研究了ni基高温合金与SiO2坩埚在真空感应熔炼过程中的界面反应。通过对界面反应的热力学和动力学分析,阐明了高温合金/SiO2界面相互作用的潜在机理。元素在界面上的扩散促进了界面反应。合金中的Al原子优先扩散到界面,在那里它们与从坩埚中扩散出来的O原子反应形成Al2O3。初始形成的Al2O3作为TiC的非均相成核位点。结果表明,在高温合金/SiO2界面处形成了连续均匀的Al2O3层和不连续的TiC层。透射电镜(TEM)分析证实了TiC与高温合金基体之间的取向关系为[01 - 1]TiC//[1 - 12]γ,表明TiC从合金基体中析出。对界面反应层厚度数据进行简化的双因素方差分析(ANOVA)表明,在略高于高温合金熔点的温度范围内,熔化时间是影响界面反应层厚度的主要因素。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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