Recent advances of carbon dots for the detection and removal of water contaminants

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2025-03-09 DOI:10.1016/j.mssp.2025.109424
Hui Li , Xicheng Li , Shuyan Wei , Changzheng Wang , Yang Zhang
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Abstract

Water pollution poses an increasing global threat to the environment and sustainable development of human society. The development of novel materials and technologies hold the promise for highly efficient detection and treatment of water contaminants from various industries that playing an essential role in both social and economic benefits. Recently, carbon dots (CDs) emerge as a novel type of low-dimensional carbon nanomaterials with the advantages of high photo/thermal stability, negligible photobleaching, excellent biocompatibility and low environmental toxicity, holding immense potential for toxic-element determination and pollution control in aquatic environments. In this review, we aim to summarize the recent progress in the design and synthesis of CDs-based nanomaterials and nanocomposites, and highlight their applications in the detection and treatment of water contaminants. Furthermore, the potential and problems of CDs-based nanocomposites are discussed with the aim to achieve fruitful results in the high-sensitive detection and high-efficiency removal of water contaminants from different sources.
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碳点检测与去除水污染物的研究进展
水污染对环境和人类社会的可持续发展构成了日益严重的全球性威胁。新材料和新技术的发展有望高效地检测和处理来自各行各业的水污染物,这在社会和经济效益中都起着至关重要的作用。近年来,碳点作为一种新型的低维碳纳米材料,具有光/热稳定性高、可忽略光漂、良好的生物相容性和低环境毒性等优点,在水生环境中有毒元素的测定和污染控制方面具有巨大的潜力。本文综述了近年来基于cds的纳米材料和纳米复合材料的设计和合成,并重点介绍了它们在水污染物检测和处理中的应用。讨论了纳米复合材料的潜力和存在的问题,以期在不同来源的水污染物的高灵敏度检测和高效去除方面取得丰硕成果。
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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