Recent advances of carbon dots for the detection and removal of water contaminants

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2025-03-09 DOI:10.1016/j.mssp.2025.109424
Hui Li , Xicheng Li , Shuyan Wei , Changzheng Wang , Yang Zhang
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引用次数: 0

Abstract

Water pollution poses an increasing global threat to the environment and sustainable development of human society. The development of novel materials and technologies hold the promise for highly efficient detection and treatment of water contaminants from various industries that playing an essential role in both social and economic benefits. Recently, carbon dots (CDs) emerge as a novel type of low-dimensional carbon nanomaterials with the advantages of high photo/thermal stability, negligible photobleaching, excellent biocompatibility and low environmental toxicity, holding immense potential for toxic-element determination and pollution control in aquatic environments. In this review, we aim to summarize the recent progress in the design and synthesis of CDs-based nanomaterials and nanocomposites, and highlight their applications in the detection and treatment of water contaminants. Furthermore, the potential and problems of CDs-based nanocomposites are discussed with the aim to achieve fruitful results in the high-sensitive detection and high-efficiency removal of water contaminants from different sources.
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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