Design of MoS2 NCFET Featuring Subthermodynamic Limit SS, No More Than 5 mV/V DIBR, and 0.8% Threshold Voltage Variation at 10-nm Channel Length: Modeling and Analysis

IF 3.2 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Transactions on Electron Devices Pub Date : 2025-01-24 DOI:10.1109/TED.2025.3529407
Sanket Mitra;Chandrima Mondal;Abhijit Biswas
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Abstract

In this work, we present a design, model, and analysis for a multilayered transition metal dichalcogenide (TMD)-based negative capacitance (NC) FET that achieves a subthreshold swing (SS) well below the thermodynamic limit, a maximum drain-induced barrier rise (DIBR) of 5 mV/V, and a threshold voltage ( ${V} _{\text {th}}$ ) roll-up confined within 0.8% at a 10-nm channel length, using hafnium zirconium oxide (Hf0.5Zr0.5O2) as the ferroelectric material. Various parameters are considered, including ferroelectric layer thickness ( ${t} _{\text {FE}}$ ), coercive electric field ( ${E} _{c}$ ), remanent polarization ( ${P} _{r}$ ), number of molybdenum disulfide (MoS2) layers (N), equivalent front and buried oxide thicknesses (EOT $_{\mathbf {f}}$ , EOTb), channel length (L), and drain-source bias ( ${V} _{\text {DS}}$ ). A surface-potential-based model, accounting for interfacial traps, is employed to compute performance parameters such as ${V}_{\text {th}}$ , SS, and DIBR. The model is validated against simulation results and existing data. The capacitance matching is performed to ensure hysteresis-free and stable NC operation. Conditions for the ferroelectric parameters ( $\alpha $ ) and ${t}_{\text {FE}}$ are derived to mitigate short-channel effects (SCEs). Optimization is carried out to achieve subthermodynamic SS while maintaining 5 mV/V DIBR and a ${V}_{\text {th}}$ roll-up below 0.8%, with values recorded for various combinations of N, EOTf, EOTb, and ${V}_{\text {DS}}$ . Unlike direct bandgap monolayer MoS2, multilayer MoS2, an indirect bandgap semiconductor, is preferred due to its lower interface-trapped charge density and augmented performance. The feasibility of the recorded $\alpha ~{t}_{\text {FE}}$ values is verified against experimental results, and an empirical model is proposed to guide the selection of ferroelectric materials for specific ${t}_{\text {FE}}$ .
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亚热力学极限SS、DIBR不大于5 mV/V、10nm通道长度阈值电压变化为0.8%的MoS2 NCFET设计:建模与分析
在这项工作中,我们提出了一种基于多层过渡金属二硫化物(TMD)的负电容(NC)场效应管的设计,模型和分析,该场效应管在10nm通道长度下实现了远低于热力学极限的亚阈值摆幅(SS),最大漏极诱导势垒上升(DIBR)为5 mV/V,阈值电压(${V} _{\text {th}}$)卷升限制在0.8%以内。考虑了各种参数,包括铁电层厚度(${t} _{\text {FE}}$)、矫顽力电场(${E} _{c}$)、剩余极化(${P} _{r}$)、二硫化钼(MoS2)层数(N)、等效正面和埋藏氧化物厚度(EOT $_{\mathbf {f}}$、EOTb)、沟道长度(L)和漏源偏置(${V} _{\text {DS}}$)。考虑到界面陷阱,采用基于表面电位的模型计算性能参数,如${V}_{\text {th}}$、SS和DIBR。根据仿真结果和现有数据对模型进行了验证。进行电容匹配,确保无磁滞和稳定的数控运行。推导了铁电参数$\alpha $和${t}_{\text {FE}}$的条件,以减轻短通道效应(sce)。通过对N、EOTf、EOTb和${V}_{\text {DS}}$的各种组合进行记录,在保持5 mV/V DIBR和${V}_{\text {DS}}$卷升低于0.8%的情况下,对亚热力学SS进行了优化。与直接带隙单层MoS2不同,多层MoS2是一种间接带隙半导体,由于其较低的界面捕获电荷密度和增强的性能而受到青睐。根据实验结果验证了记录的$\alpha ~{t}_{\text {FE}}$值的可行性,并提出了一个指导特定${t}_{\text {FE}}$铁电材料选择的经验模型。
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来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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