Effect of deposition pressure on the microstructure, mechanical, and corrosion properties of tantalum nitride thin films deposited by reactive pulsed laser deposition

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Vacuum Pub Date : 2025-03-06 DOI:10.1016/j.vacuum.2025.114228

Avery Bend , Venkata A.S. Kandadai , Jacob B. Petersen , Bharat K. Jasthi

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引用次数: 0

Abstract

Tantalum nitride films have several beneficial properties that make them attractive for various applications, where protective coatings with excellent film integrity and corrosion resistance are essential. This study investigates the influence of deposition pressure (2, 5, and 8 mTorr) on the characteristics of tantalum nitride films synthesized by pulsed laser deposition in a pure nitrogen atmosphere. Microstructural analysis confirmed that extremely smooth films were produced, with increasing crystallinity correlated with higher deposition pressures. Grazing incidence X-ray diffraction and selective area electron diffraction analysis confirmed the formation of distinct phases, specifically hexagonal γ-Ta₂N and cubic δ-TaN, in the deposited nanofilms. Decrease in hexagonal γ-Ta₂N phase content from 90 wt% at 2 mTorr to 60 wt% at 8 mTorr was observed with corresponding increase in cubic δ-TaN phase content. The hardness and modulus of films were increased with increasing deposition pressure. Electrochemical studies conducted in 3.5 wt% NaCl solution indicated that the tantalum nitride film-coated titanium deposited at 2 mTorr exhibited a ∼6.4 times reduction in corrosion rates compared to uncoated titanium. Overall, the results suggest that deposition pressure significantly influenced the characteristics of the deposited films, indicating that the synthesis conditions can be effectively optimized for specific coating applications based on desired properties.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.