Residual Al Adatoms Driven Epitaxy of AlGaN QWs for High-Performance UV LEDs

IF 26.8 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY Advanced Materials Pub Date : 2025-03-13 DOI:10.1002/adma.202501601
Tai Li, Zhaoying Chen, Tao Wang, Wei Luo, Renchun Tao, Zexing Yuan, Tongxin Lu, Yucheng Guo, Ye Yuan, Shangfeng Liu, Junjie Kang, Ping Wang, Bowen Sheng, Fang Liu, Qi Wang, Shengqiang Zhou, Bo Shen, Xinqiang Wang
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Abstract

AlGaN-based ultraviolet (UV) light-emitting diodes (LEDs) experience a notable reduction in efficiency within the 280–330 nm wavelength range, known as the “UVB gap”. Given the extensive applications of UV LEDs in this wavelength range, it is imperative to bridge this efficiency gap. In this study, a strategy facilitated by the presence of residual Al adatoms is introduced to simultaneously improve the integration of Ga-adatoms and the migration of Al/Ga-adatoms during the growth of low-Al-composition AlGaN quantum wells (QWs) even at high temperatures comparable to those used for high-Al-composition AlGaN quantum barriers. This growth strategy enables the epitaxy of high-quality AlGaN QWs with a wide tunable emission wavelength range across the UVB gap. Utilizing this approach, high-efficiency UV LEDs that effectively bridge the UVB gap are developed. Furthermore, benefiting from this QWs growth configuration, these UV LEDs exhibit an exceptionally long L70 lifetime, marking a significant step forward in the growth technology of AlGaN QWs and expanding the application possibilities of UV LEDs.

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高性能UV led用残余铝原子驱动AlGaN量子阱外延
海藻基紫外发光二极管(led)在280-330 nm波长范围内的效率显著降低,被称为“UVB间隙”。鉴于UV led在该波长范围内的广泛应用,必须弥合这种效率差距。在这项研究中,引入了一种由残余Al adatoms的存在促进的策略,在低Al组成的AlGaN量子阱(QWs)生长过程中,即使在与高Al组成的AlGaN量子势垒相当的高温下,也能同时改善Ga-adatoms的集成和Al/Ga-adatoms的迁移。这种生长策略使得高质量的AlGaN量子阱外延具有跨UVB间隙的宽可调谐发射波长范围。利用这种方法,高效的UV led,有效地弥合UVB差距被开发出来。此外,得益于这种qw生长结构,这些UV led具有超长的L70寿命,标志着AlGaN qw生长技术向前迈出了重要一步,并扩大了UV led的应用可能性。
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来源期刊
Advanced Materials
Advanced Materials 工程技术-材料科学:综合
CiteScore
43.00
自引率
4.10%
发文量
2182
审稿时长
2 months
期刊介绍: Advanced Materials, one of the world's most prestigious journals and the foundation of the Advanced portfolio, is the home of choice for best-in-class materials science for more than 30 years. Following this fast-growing and interdisciplinary field, we are considering and publishing the most important discoveries on any and all materials from materials scientists, chemists, physicists, engineers as well as health and life scientists and bringing you the latest results and trends in modern materials-related research every week.
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