Intersections of pore channels in track-etched polymer templates and membranes

IF 4.3 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Chemistry and Physics Pub Date : 2025-03-08 DOI:10.1016/j.matchemphys.2025.130681
P.Y. Apel
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Abstract

Track-etched membranes (TMs) have been known as micro- and nanoporous materials with a well-determined structure. The production method, which includes irradiation with accelerated heavy ions and subsequent chemical etching, ensures the formation of uniform straight cylindrical channels in the membranes. Numerous applications of TMs take advantage of these specific properties. The pores in commercial TMs are often regarded as individual non-interconnected channels. However, due to the angle distribution of ions impinging the polymer film, the channels are non-parallel and may intersect. The intersections between the channels show up in precision experiments and play an important role in the fabrication of nanomaterials where track-etched membranes serve as templates. Polymer-metal composites and free-standing 3D metal nanostructures are representative examples of such materials. Of practical importance is thus the estimation of the number of channel intersections depending on the membrane structure parameters. This paper describes a simple approach for determining the mean numbers of channel intersections in track-etched membranes produced using ion beams from accelerators. The conditions for the formation of a percolation network are discussed.

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轨迹蚀刻聚合物模板和膜中孔道的交叉点
轨道蚀刻膜(TMs)是一种具有确定结构的微孔和纳米多孔材料。其生产方法包括加速重离子辐照和随后的化学蚀刻,确保在膜中形成均匀的直圆柱形通道。膜过滤材料的许多应用都利用了这些特殊性能。商业 TM 中的孔通常被视为单独的非互连通道。然而,由于离子撞击聚合物膜的角度分布,通道是不平行的,并且可能相交。在精密实验中,通道之间的交集会显现出来,并在纳米材料的制造过程中发挥重要作用,其中轨道蚀刻膜可作为模板。聚合物金属复合材料和独立三维金属纳米结构就是此类材料的代表。因此,根据膜结构参数估算通道交叉点数量具有重要的实际意义。本文介绍了一种简单的方法,用于确定使用加速器离子束产生的轨迹蚀刻膜中通道交叉的平均数量。本文讨论了形成渗滤网络的条件。
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来源期刊
Materials Chemistry and Physics
Materials Chemistry and Physics 工程技术-材料科学:综合
CiteScore
8.70
自引率
4.30%
发文量
1515
审稿时长
69 days
期刊介绍: Materials Chemistry and Physics is devoted to short communications, full-length research papers and feature articles on interrelationships among structure, properties, processing and performance of materials. The Editors welcome manuscripts on thin films, surface and interface science, materials degradation and reliability, metallurgy, semiconductors and optoelectronic materials, fine ceramics, magnetics, superconductors, specialty polymers, nano-materials and composite materials.
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