Cover Feature: Effect of UV Light Exposure Duration on the Removal of Exfoliation Agent Residues in Two-Dimensional Perovskite Nanosheets: An AFM Study (ChemPlusChem 3/2025)
Fatma Pinar Gordesli-Duatepe, Begümnur Küçükcan, Özge Sağlam
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引用次数: 0
Abstract
The cover feature shows AFM detection of exfoliation agent residue removal on perovskite nanosheet-based nanofilms after UV exposure. AFM measurements, performed using a silicon probe, reveal how surface properties evolve with UV exposure duration, influencing nanosheet homogeneity and adhesion. The findings highlight the need to optimize UV exposure duration for effective residue removal while preserving surface quality. More details can be found in the Research Article by Fatma Pinar Gordesli-Duatepe, Özge Sağlam, and Begümnur Küçükcan (DOI: 10.1002/cplu.202400678).
覆盖特征显示了紫外照射后钙钛矿纳米片基纳米膜上剥离剂残留去除的AFM检测。使用硅探针进行的AFM测量揭示了表面性质如何随紫外线照射时间的变化而变化，影响纳米片的均匀性和附着力。研究结果强调需要优化紫外线照射时间，以有效去除残留物，同时保持表面质量。更多细节可以在Fatma Pinar Gordesli-Duatepe， Özge Sağlam和beg mnur k kcan （DOI: 10.1002/cplu.202400678）的研究文章中找到。
期刊介绍：
ChemPlusChem is a peer-reviewed, general chemistry journal that brings readers the very best in multidisciplinary research centering on chemistry. It is published on behalf of Chemistry Europe, an association of 16 European chemical societies.
Fully comprehensive in its scope, ChemPlusChem publishes articles covering new results from at least two different aspects (subfields) of chemistry or one of chemistry and one of another scientific discipline (one chemistry topic plus another one, hence the title ChemPlusChem). All suitable submissions undergo balanced peer review by experts in the field to ensure the highest quality, originality, relevance, significance, and validity.
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