Fabrication of V2O5/porous silicon heterostructures by simple and low-cost methods, morphological, structural, optical, and electrical characterization, and their first application as photodetectors

IF 4.9 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Sensors and Actuators A-physical Pub Date : 2025-06-01 Epub Date: 2025-03-17 DOI:10.1016/j.sna.2025.116471
A. Garzon-Roman , C.M. Díaz-Barba , D.H. Cuate-Gomez , E. Sanchez-Mora , M.E. de Anda-Reyes , A. Romero-López , C. Zúñiga-Islas , W. Calleja-Arriaga
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Abstract

This research presents the fabrication of heterostructures based on V2O5/porous silicon, their morphological, optical, structural, and electrical characterization, and their application as photodetectors. The fabrication of these heterostructures was performed in one step and with simple and low-cost methods compared to other more complex processes reported in the literature. The porous silicon layers were synthesized using the electrochemical anodization method and the V2O5 structures were obtained with the solvothermal or hydrothermal method, in this step the heterostructures were fabricated. The morphological characterization showed the formation of pores, these pores showed quasi-circular and irregular shapes, an average diameter of about 1.4 μm, and a pore length of around 22 μm perfectly aligned. The morphology of the V2O5 structures showed two morphologies a combination of concentric nanosheets and nanobelts with a thickness between 50 and 100 nm and a length greater than 10 μm for one sample and hollow microspheres with a diameter of about 5 μm for the second sample. The micro-Raman spectra demonstrated the formation of the orthorhombic V2O5 phase due to the Raman signals reported in the literature. X-ray diffraction corroborated the formation of the orthorhombic V2O5 phase, and it was possible to estimate the cell parameters and the size of the crystallites, which were found to be 31.5 and 16.4 nm. The optical characterization by photoluminescence showed main bands centered at 550 nm for the PS and 707 nm for the V2O5 structures. In addition, a passivation effect was observed after the deposition of the V2O5 structures on the porous silicon. Diffuse reflectance spectra together with the Kubelka-Munk method allowed us to estimate the optical bandgap which was 1.5 eV and about 2.1 eV for porous silicon and V2O5, respectively. Finally, electrical characterization under dark and illumination conditions showed rectifying and ohmic behaviors for the heterostructures, and a photocurrent effect was observed in the I-V curves. The photocurrent effect allowed the analysis of the I-t curves, which demonstrated the application of these heterostructures as the simplest photodetectors ever reported.
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用简单和低成本的方法制备V2O5/多孔硅异质结构,形态学,结构,光学和电学表征,以及它们作为光电探测器的首次应用
本研究介绍了基于V2O5/多孔硅的异质结构材料的制备、形貌、光学、结构和电学表征及其在光电探测器中的应用。与文献中报道的其他更复杂的工艺相比,这些异质结构的制备一步完成,方法简单,成本低。采用电化学阳极氧化法合成多孔硅层,采用溶剂热法或水热法制备V2O5结构,并在此步骤中制备异质结构。形貌表征表明,微孔呈准圆形和不规则形状,平均直径约1.4 μm,孔径约22 μm,排列整齐。V2O5结构的形貌表现为厚度在50 ~ 100 nm之间、长度大于10 μm的同心纳米片和纳米带的组合,以及直径约为5 μm的空心微球的组合。微拉曼光谱表明,由于文献报道的拉曼信号,形成了正交V2O5相。x射线衍射证实了正交V2O5相的形成,并可以估计出晶胞参数和晶粒尺寸,分别为31.5 nm和16.4 nm。光致发光表征表明,PS和V2O5结构的主能带以550 nm和707 nm为中心。此外,在多孔硅表面沉积V2O5结构后还观察到钝化效应。利用漫反射光谱和Kubelka-Munk方法估算出多孔硅和V2O5的光学带隙分别为1.5 eV和2.1 eV。最后,在黑暗和光照条件下的电学表征显示了异质结构的整流和欧姆行为,并且在I-V曲线中观察到光电流效应。光电流效应允许对I-t曲线进行分析,这证明了这些异质结构作为迄今报道的最简单的光电探测器的应用。
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来源期刊
Sensors and Actuators A-physical
Sensors and Actuators A-physical 工程技术-工程:电子与电气
CiteScore
8.10
自引率
6.50%
发文量
630
审稿时长
49 days
期刊介绍: Sensors and Actuators A: Physical brings together multidisciplinary interests in one journal entirely devoted to disseminating information on all aspects of research and development of solid-state devices for transducing physical signals. Sensors and Actuators A: Physical regularly publishes original papers, letters to the Editors and from time to time invited review articles within the following device areas: • Fundamentals and Physics, such as: classification of effects, physical effects, measurement theory, modelling of sensors, measurement standards, measurement errors, units and constants, time and frequency measurement. Modeling papers should bring new modeling techniques to the field and be supported by experimental results. • Materials and their Processing, such as: piezoelectric materials, polymers, metal oxides, III-V and II-VI semiconductors, thick and thin films, optical glass fibres, amorphous, polycrystalline and monocrystalline silicon. • Optoelectronic sensors, such as: photovoltaic diodes, photoconductors, photodiodes, phototransistors, positron-sensitive photodetectors, optoisolators, photodiode arrays, charge-coupled devices, light-emitting diodes, injection lasers and liquid-crystal displays. • Mechanical sensors, such as: metallic, thin-film and semiconductor strain gauges, diffused silicon pressure sensors, silicon accelerometers, solid-state displacement transducers, piezo junction devices, piezoelectric field-effect transducers (PiFETs), tunnel-diode strain sensors, surface acoustic wave devices, silicon micromechanical switches, solid-state flow meters and electronic flow controllers. Etc...
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