Impact of Electrostatic Discharge on the Degradation from Pixel to Panel Level of Quantum-Dot Light-Emitting Diode

IF 12.1 2区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY Small Pub Date : 2025-03-20 DOI:10.1002/smll.202411539
Suwoon Lee, Hansol Choi, Hyunho Lee, Hyung-Jun Song
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Abstract

Recent advances in quantum dot light emitting diode (QLED) technology have enhanced their stability and efficiency. Studies have demonstrated that QLEDs are robust against oxygen, moisture, and low-voltage stress. However, the impact of instantaneous high-voltage exposure on QLEDs, which can occur during manufacturing due to electrostatic discharge (ESD) from friction between non-conductive components, remains unclear. This study systematically investigates the degradation mechanisms of QLEDs caused by ESD at the level of individual layers, pixels, and the overall display panel. When subjected to ESD pulses of several thousand volts for a few nanoseconds, QLEDs exhibit increased leakage current, reduced electroluminescence intensity, and the formation of dark spots within pixels due to the degradation of electrodes rather than the degradation of QDs. Under severe ESD stress (over 10 kV), the electrodes migrate within the device and are finally disconnected. Microstructural analysis confirms that the decreased physical distance between the two electrodes intensified the electric field, potentially converting a diode into a short circuit. The directly exposed pixels are affected by ESD, and those positioned between the ESD source and the ground may also be damaged. These findings underscore the necessity of managing electrostatic accumulation during QLED fabrication to mitigate ESD-related degradation.

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静电放电对量子点发光二极管像素级到面板级退化的影响
量子点发光二极管(QLED)技术的最新进展提高了其稳定性和效率。研究表明,qled在氧气、湿气和低压应力下都很健壮。然而,瞬时高压暴露对qled的影响,这可能发生在制造过程中,由于非导电元件之间的摩擦产生静电放电(ESD),目前尚不清楚。本研究系统地研究了静电放电在单个层、像素和整个显示面板上引起的qled的退化机制。当受到数千伏特的ESD脉冲持续几纳秒时,qled表现出泄漏电流增加,电致发光强度降低,并且由于电极的退化而不是量子点的退化而在像素内形成黑点。在严重的ESD应力(超过10 kV)下,电极在器件内迁移并最终断开。微观结构分析证实,两个电极之间物理距离的减小增强了电场,有可能使二极管发生短路。直接暴露的像素点会受到ESD的影响,位于ESD源和地之间的像素点也可能受到损坏。这些发现强调了在QLED制造过程中管理静电积累以减轻静电相关退化的必要性。
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来源期刊
Small
Small 工程技术-材料科学:综合
CiteScore
17.70
自引率
3.80%
发文量
1830
审稿时长
2.1 months
期刊介绍: Small serves as an exceptional platform for both experimental and theoretical studies in fundamental and applied interdisciplinary research at the nano- and microscale. The journal offers a compelling mix of peer-reviewed Research Articles, Reviews, Perspectives, and Comments. With a remarkable 2022 Journal Impact Factor of 13.3 (Journal Citation Reports from Clarivate Analytics, 2023), Small remains among the top multidisciplinary journals, covering a wide range of topics at the interface of materials science, chemistry, physics, engineering, medicine, and biology. Small's readership includes biochemists, biologists, biomedical scientists, chemists, engineers, information technologists, materials scientists, physicists, and theoreticians alike.
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