Effect and mechanism of thiourea on indium electrocrystallization in sulfate electrolyte

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2025-03-25 DOI:10.1016/j.mssp.2025.109493
Zeyu Wang , Xun Wang , Bo Li , Yonggang Wei , Hua Wang
{"title":"Effect and mechanism of thiourea on indium electrocrystallization in sulfate electrolyte","authors":"Zeyu Wang ,&nbsp;Xun Wang ,&nbsp;Bo Li ,&nbsp;Yonggang Wei ,&nbsp;Hua Wang","doi":"10.1016/j.mssp.2025.109493","DOIUrl":null,"url":null,"abstract":"<div><div>In the realm of advanced technologies, indium is a critical metal with wide-ranging applications, and the efficient purification of indium has emerged as a topic of significant industrial interest. This study investigates the use of gelatin and thiourea as additives to mitigate the adverse effects of dendrite growth during indium electrolysis. Additionally, agitation was incorporated into the electrolysis process to further enhance the morphology of cathodic indium deposition. Under optimal conditions of 0.5 g/L gelatin and 0.05 g/L thiourea, current efficiency increased by 6.2 %, while the recovery improved by 5.7 %. Scanning electron microscopy (SEM) was employed to examine the dendritic growth of indium on titanium electrodes. The findings indicated that the combination of gelatin, thiourea, and stirring led to a more compact and uniform coating. The electrodeposition mechanisms of indium in various electrolytic environments were further elucidated through cyclic voltammetry and chronoamperometry, revealing that under the influence of gelatin and thiourea, the nucleation process on titanium shifted to a continuous mode.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"193 ","pages":"Article 109493"},"PeriodicalIF":4.2000,"publicationDate":"2025-03-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800125002306","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

In the realm of advanced technologies, indium is a critical metal with wide-ranging applications, and the efficient purification of indium has emerged as a topic of significant industrial interest. This study investigates the use of gelatin and thiourea as additives to mitigate the adverse effects of dendrite growth during indium electrolysis. Additionally, agitation was incorporated into the electrolysis process to further enhance the morphology of cathodic indium deposition. Under optimal conditions of 0.5 g/L gelatin and 0.05 g/L thiourea, current efficiency increased by 6.2 %, while the recovery improved by 5.7 %. Scanning electron microscopy (SEM) was employed to examine the dendritic growth of indium on titanium electrodes. The findings indicated that the combination of gelatin, thiourea, and stirring led to a more compact and uniform coating. The electrodeposition mechanisms of indium in various electrolytic environments were further elucidated through cyclic voltammetry and chronoamperometry, revealing that under the influence of gelatin and thiourea, the nucleation process on titanium shifted to a continuous mode.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
求助全文
约1分钟内获得全文 去求助
相关文献
Effect of thiourea on polarographic reduction of indium(III) in perchloric acid
IF 7.4 1区 化学Analytical ChemistryPub Date : 1982-03-01 DOI: 10.1021/ac00240a063
Kazimierz. Sykut, Grazyna. Dalmata, Barbara. Nowicka, Jadwiga. Saba
Effect of glassy carbon, gold, and nickel electrodes on nickel electrocrystallization in an industrial electrolyte
IF 5.4 2区 材料科学Surface & Coatings TechnologyPub Date : 2019-07-25 DOI: 10.1016/j.surfcoat.2019.04.072
Yangtao Xu, Kai Huang, Zhenxu Zhu, Tiandong Xia
来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
期刊最新文献
Structural, substructural, magnetic, and electrical properties of Ti-substituted tetrahedrites with enhanced thermoelectric performance Study of half metallic ferromagnetism, Curie temperature, and thermoelectric aspects of double perovskite oxides Ba2XMoO6 (X = Cr, Mn, Fe, Co) for spintronic applications Synthesis, characterization and catalytic applications of CaO-Cu decorated PANI/SA nanocomposites for wastewater treatment Pressure effects on the electronic, optical, and thermodynamic properties in van der waals multiferroic NiI2 Growth, optimization and high-temperature performance of GeO2/Ga2O3 MOSCAPs
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1